2009
DOI: 10.1109/ted.2009.2021364
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Compact Thermal Model for Vertical Nanowire Phase-Change Memory Cells

Abstract: We introduce a compact model for the temperature distribution in cylindrical nanowire (NW) phase-change memory (PCM) cells for both transient (nanoseconds) and steady-state time scales. The model takes advantage of the symmetry of the cell to efficiently calculate temperature distribution dependence on geometry and material/interface properties. The results are compared with data from the literature and with finite-element simulations, showing improved computation speed by two orders of magnitude. Programming … Show more

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Cited by 22 publications
(16 citation statements)
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“…Care must also be taken with the limiting cases W ≫ t ox (1-dimensional heat flow through underlying oxide) as opposed to d or W ≪ t ox (3dimensional spreading into oxide), the latter being the case for all nanotube, nanowire, and even graphene nanoribbon data [90] typically available. Finally, the thermal boundary resistance (TBR) at the interfaces between the devices and its environment can also be a limiting factor, as is the case with nanotubes [30,91], phase-change memory devices [92,93], and to some extent graphene transistors [94,95]. The TBR in the latter case is approximately equivalent to the thermal resistance of 20-50 nm SiO 2 at room temperature, and of relatively little contribution to the commonly used graphene samples on 300 nm SiO 2 .…”
Section: Steady-state Thermal Resistancementioning
confidence: 99%
“…Care must also be taken with the limiting cases W ≫ t ox (1-dimensional heat flow through underlying oxide) as opposed to d or W ≪ t ox (3dimensional spreading into oxide), the latter being the case for all nanotube, nanowire, and even graphene nanoribbon data [90] typically available. Finally, the thermal boundary resistance (TBR) at the interfaces between the devices and its environment can also be a limiting factor, as is the case with nanotubes [30,91], phase-change memory devices [92,93], and to some extent graphene transistors [94,95]. The TBR in the latter case is approximately equivalent to the thermal resistance of 20-50 nm SiO 2 at room temperature, and of relatively little contribution to the commonly used graphene samples on 300 nm SiO 2 .…”
Section: Steady-state Thermal Resistancementioning
confidence: 99%
“…Experiments have shown [44][45][46] ), so adding TBR simply makes it a slightly poorer thermal conductor.…”
Section: Discussionmentioning
confidence: 99%
“…Apart from the typical mushroom cell geometry [2], the most common geometry variant is the vertical pillar structure [5,12,13], which may be typically fabricated using nanowires. Other methods to reduce programming currents include changes in electrode materials [14], doping of the active region [15], and the possible use of thermoelectric effects [16,17].…”
Section: Introductionmentioning
confidence: 99%
“…Vertical pillar structures [5,12,13], on the one hand, are reported to have smaller programming currents due to confined size dimensions. These vertical cells also feature a less abrupt transition between the low and the high resistance states, thus making it possible to also engineer multi-bit operations [20].…”
Section: Introductionmentioning
confidence: 99%
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