Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography

Horák, Michal; Bukvišová, Kristýna; Švarc, Vojtěch; Jaskowiec, Jiří; Křápek, Vlastimil; Šikola, Tomáš

doi:10.1038/s41598-018-28037-1

Cited by 84 publications

(60 citation statements)

References 40 publications

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“…It is one of the most powerful techniques for nanostructure formation with nanometer-scale precision in designing shape, size, and arrangement [37,38]. Consequently, the surface plasmon resonance peak can be tuned over wide wavelengths.…”

Section: Electron Beam Lithography (Ebl)mentioning

confidence: 99%

“…However, this is still time-consuming and expensive for large scale production. Additionally, the heavier ions, most commonly gallium ions, used for creating the nanostructures easily contaminate the sample by implanting the heavy metal and have low resolution compared to EBL [37]. However, with the recent development of technologies, helium ion beams can now be used to create a nanostructured thin film with a resolution of 3.5 nm [49].…”

Section: Pantf By Removal Of Materialsmentioning

confidence: 99%

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Plasmonic-Active Nanostructured Thin Films

2020

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Plasmonic-active nanomaterials are of high interest to scientists because of their expanding applications in the field for medicine and energy. Chemical and biological sensors based on plasmonic nanomaterials are well-established and commercially available, but the role of plasmonic nanomaterials on photothermal therapeutics, solar cells, super-resolution imaging, organic synthesis, etc. is still emerging. The effectiveness of the plasmonic materials on these technologies depends on their stability and sensitivity. Preparing plasmonics-active nanostructured thin films (PANTFs) on a solid substrate improves their physical stability. More importantly, the surface plasmons of thin film and that of nanostructures can couple in PANTFs enhancing the sensitivity. A PANTF can be used as a transducer for any of the three plasmonic-based sensing techniques, namely, the propagating surface plasmon, localized surface plasmon resonance, and surface-enhanced Raman spectroscopy-based sensing techniques. Additionally, continuous nanostructured metal films have an advantage for implementing electrical controls such as simultaneous sensing using both plasmonic and electrochemical techniques. Although research and development on PANTFs have been rapidly advancing, very few reviews on synthetic methods have been published. In this review, we provide some fundamental and practical aspects of plasmonics along with the recent advances in PANTFs synthesis, focusing on the advantages and shortcomings of the fabrication techniques. We also provide an overview of different types of PANTFs and their sensitivity for biosensing.

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Section: Electron Beam Lithography (Ebl)mentioning

confidence: 99%

Section: Pantf By Removal Of Materialsmentioning

confidence: 99%

Plasmonic-Active Nanostructured Thin Films

2020

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“…Several nanolithography techniques have been used to fabricate plasmonic nano-antennas, including focused ion beam (FIB) [25], nanoimprint lithography (NIL) [26] and electron-beam lithography (EBL) [27]. FIB creates nano-antennas with lower structural quality compared to EBL and presents multiple problems, such as metal redeposition, ion contamination and thickness variation [28]. Furthermore, NIL requires the use of other nanofabrication techniques to generate the mold necessary to replicate the structures.…”

Section: Introductionmentioning

confidence: 99%

Double metal layer lift-off process for the robust fabrication of plasmonic nano-antenna arrays on dielectric substrates using e-beam lithography

Muñoz

Yong

Dijkstra

et al. 2019

Opt. Mater. Express

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Integrated plasmonic sensors often require the nanofabrication of metallic structures on top of dielectric substrates by nanolithographic methods such as electron beam lithography (EBL). One of the preferred metals for the realization of such nanostructures is gold given both its corrosion resistance and favorable refractive index in the visible and NIR regions. Due to its inert nature, gold offers very poor adhesion to dielectric layers, therefore often requiring the deposition of a thin metallic layer as adhesion promoter. The presence of this layer has a negative influence on the plasmonic behavior of the resulting nano-antennas. Thus, the thickness of the adhesion layer should be kept as thin as possible. Moreover, the use of EBL on non-conductive substrates leads to charge accumulation in the isolating materials (i.e., charging effect), which degrades the resolution of the lithography. A possible solution to this problem is the use of an anti-charging layer under the electron sensitive resist, which should be thick enough to offer high conductivity. In this work, we present a nanofabrication process that decouples the contradicting requirements for the metal layers, permitting to independently optimize both the thickness and type of the metal used as anti-charging layer and as adhesion layer underneath the nanostructures. Additionally, the proposed method permits eliminating any metal residue during the lift-off process, leading to a perfectly clean device outside the nanostructured region, which is instrumental when the nanostructures are to be integrated with other photonic functions on the chip.

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“…Traditionally, plasmonic clusters with tailored size and geometry are fabricated on substrates by topdown processes such as electron-beam lithography 4,5 or focused-ion beam milling 27,28 . These approaches suffer from low throughput and are generally limited to in-plane fabrication.…”

mentioning

confidence: 99%

Freeform 3D Plasmonic Superstructures

Kim

Lee

Devaraj

et al. 2020

Preprint

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Plasmonic nanoparticle clusters promise to support various, unique artificial electromagnetisms at optical frequencies, realizing new concept devices for diverse nanophotonic applications. However, the technological challenges associated with the fabrication of plasmonic clusters with programmed geometry and composition remain unresolved. Here, we present a freeform fabrication of hierarchical plasmonic clusters (HPCs) based on omnidirectional guiding of evaporative self-assembly of gold nanoparticles (AuNPs) with the aid of 3D printing. Our method offers a facile, universal route to shape the multiscale features of HPCs in three-dimensions, leading to versatile manipulation of both far-field and near-field characteristics. Various functional nanomaterials can be effectively coupled to plasmonic modes of the HPCs by simply mixing with AuNP ink. We demonstrate in particular an ultracompact surface-enhanced Raman spectroscopy (SERS) platform to detect M13 viruses and their mutations from femtolitre volume, sub-100pM analytes. This SERS microplatform could pave the way towards simple, innovative detection methods of diverse pathogens, which is in high demand for handling pandemic situations. We expect our method to freely design and realize nanophotonic structures beyond the restrictions of traditional fabrication processes. Plasmonic nanoparticle clusters have attracted great attention due to the unique capability to manipulate electromagnetic fields at the sub-wavelength scale1–5. Ensembles of metallic nanoparticles generate various electromagnetisms at optical frequencies such as artificial magnetism6–10 and Fano-like interference11–13 and a strong field localization in the structure14–16. These unique properties are geometry-dependent and lead to a broad range of applications in sensing16,17, surface-enhanced spectroscopies18–22, nonlinear integrated photonics23,24, and light harvesting25,26. Traditionally, plasmonic clusters with tailored size and geometry are fabricated on substrates by top-down processes such as electron-beam lithography4,5 or focused-ion beam milling27,28. These approaches suffer from low throughput and are generally limited to in-plane fabrication. Alternatively, the self-assembly of colloids has been proposed as a versatile, high-throughput, and cost-effective route. A number of clever methods based on chemical linking (e.g., DNA origami)29–30 and/or convective assembly on lithographically structured templates25,26,31 have been devised to construct 2D or 3D plasmonic clusters. The shape formation, however, is mostly constrained by the thermodynamic impetus and/or template geometry. A significant challenge would be overcome these restrictions and expand structural design freedom in the fabrication of plasmonic cluster architectures with symmetry-breaking geometries. In this work, we develop a freeform, programmable 3D assembly of of hierarchical plasmonic clusters (HPCs). By exploiting micronozzle 3D printing, we demonstrate highly localized, omnidirectional meniscus-guided assembly of metallic nanoparticles, constructing a freestanding HPC with a tailored geometry that can control the far-field character. Our approach also allows versatile manipulation and exploitation of the near-field interaction in the HPC by a facile heterogeneous nanoparticle mixing. We demonstrate that 3D-printed HPCs can be utilized as an ultracompact surface-enhanced Raman spectroscopy (SERS) platform to detect M13 viruses and their mutations from femtolitre volume, sub-100pM analytes.

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Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography

Cited by 84 publications

References 40 publications

Plasmonic-Active Nanostructured Thin Films

Plasmonic-Active Nanostructured Thin Films

Double metal layer lift-off process for the robust fabrication of plasmonic nano-antenna arrays on dielectric substrates using e-beam lithography

Freeform 3D Plasmonic Superstructures

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