2013
DOI: 10.1063/1.4824813
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Comparison of amorphous silicon absorber materials: Light-induced degradation and solar cell efficiency

Abstract: Several amorphous silicon (a-Si:H) deposition conditions have been reported to produce films that degrade least under light soaking when incorporated into a-Si:H solar cells. However, a systematic comparison of these a-Si:H materials has never been presented. In the present study, different plasma-enhanced chemical vapor deposition conditions, yielding standard low-pressure VHF a-Si:H, protocrystalline, polymorphous, and high-pressure RF a-Si:H materials, are compared with respect to their optical properties a… Show more

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Cited by 51 publications
(40 citation statements)
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“…30,58 The part of the substrate dependence of V oc that was not linked to a different effective p-(a-SiC:H)-layer thickness could be correlated to the roughness dependence of porous zones. Such porous zones with voids contain more defects-dangling bonds-than dense aSi:H material.…”
Section: E Simulated Substrate Dependencementioning
confidence: 99%
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“…30,58 The part of the substrate dependence of V oc that was not linked to a different effective p-(a-SiC:H)-layer thickness could be correlated to the roughness dependence of porous zones. Such porous zones with voids contain more defects-dangling bonds-than dense aSi:H material.…”
Section: E Simulated Substrate Dependencementioning
confidence: 99%
“…More details about individual layers, the reactor, and gas precursors can be found elsewhere. 30 We measured current-voltage (I(V)) characteristics under a four-lamp (three halogen, one xenon) solar simulator from Wacom (class AAA) under standard conditions (AM1.5g, 1000 W/m 2 , 25 C). 41,42 The current was determined from external quantum efficiency (EQE) measurements, taken with a system built in-house.…”
Section: Methodsmentioning
confidence: 99%
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“…18 At the same time it has been shown that such attempts to increase the hydrogen content and improve the passivation quality can significantly alter the nanostructure of a-Si:H leading to void-rich material and in some cases cause irreversible damage at the interface. In this work we demonstrate PECVD conditions using high hydrogen dilution (200 sccm H 2 compared to 2.5 to 10 sccm SiH 4 ), low power density (∼0.05 W/cm 2 ), and relatively high deposition pressure (8 mbar) 20 that result in material close to the a-Si:H-to-µc-Si:H transition regime, passivating c-Si and achieving effective lifetimes (τ eff ) > 10 ms. As a result of the low power density and high deposition pressure the ion bombardment energy is decreased, 21 thereby minimizing possible damage on and just below the surface of the c-Si substrate while shifting the a-Si:H-to-µc-Si:H transition to higher dilutions and allowing to deposit amorphous silicon at extremely high dilution conditions. We show how the τ eff correlates to changes in the nanostructure of the material, which in turn is varied by changing the hydrogen dilution and substrate temperature.…”
Section: Introductionmentioning
confidence: 99%
“…The latter is usually attributed to the generation of deep defects that act as recombination centers, 26 and is commonly referred to as the Staebler-Wronski effect (SWE). [27][28][29][30][31] Crystalline Si surfaces coated with intrinsic a-Si:H films were found to suffer as well from a degradation in surface passivation during prolonged light soaking (LS). 32 Kinetically, this degradation follows so-called power laws of a similar form as for bulk a-Si:H, suggesting that the intrinsic a-Si:H/c-Si interface equally suffers from SWE.…”
mentioning
confidence: 99%