2009
DOI: 10.1021/nl900803z
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Comparison of Epitaxial Graphene on Si-face and C-face 4H SiC Formed by Ultrahigh Vacuum and RF Furnace Production

Abstract: We present X-ray photoelectron spectroscopy, van der Pauw Hall mobilities, low-temperature far-infrared magneto transmission (FIR-MT), and atomic force microscopy (AFM) results from graphene films produced by radiative heating in an ultrahigh vacuum (UHV) chamber or produced by radio frequency (RF) furnace annealing in a high vacuum chemical vapor deposition system on Si- and C-face 4H SiC substrates at 1200-1600 degrees C. Although the vacuum level and heating methods are different, graphene films produced by… Show more

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Cited by 145 publications
(124 citation statements)
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References 25 publications
(43 reference statements)
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“…This screening preserves the high intrinsic carrier mobility of graphene, allowing for the highest carrier mobility among the three conduction channels. While high carrier mobilities in the quasi-intrinsic part of the MLG have also been previously investigated by far infrared optical absorption techniques [11,12], the results and analysis shown here present the first evidence of such high mobility carriers in electrical measurements. The origin of the dominant hole carriers (p-type doping) in the uppermost graphene layers is currently unknown, but is likely caused by the adsorbed species on the graphene surface.…”
mentioning
confidence: 52%
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“…This screening preserves the high intrinsic carrier mobility of graphene, allowing for the highest carrier mobility among the three conduction channels. While high carrier mobilities in the quasi-intrinsic part of the MLG have also been previously investigated by far infrared optical absorption techniques [11,12], the results and analysis shown here present the first evidence of such high mobility carriers in electrical measurements. The origin of the dominant hole carriers (p-type doping) in the uppermost graphene layers is currently unknown, but is likely caused by the adsorbed species on the graphene surface.…”
mentioning
confidence: 52%
“…In the Cface MLG, it was noted that cyclotron resonance measurements typically yield much higher carrier mobilities than those obtained from direct electrical measurements [11,12], suggesting non-homogeneous carriers in the system. Therefore, to characterize the transport properties of MLG grown on the C-face of SiC, alternative measurements and analysis techniques are required.…”
mentioning
confidence: 99%
“…Those results are in agreement with prior reports of other workers. [1][2][3][4][5][6][7][9][10][11][12][13][14] Before graphene forms on the Si-face, the well known 6√3 layer forms on the surface after annealing in vacuum at temperatures of ≈1200°C. 40 Further heating to about 1250°C produces graphene thickness of 1 -2 ML (Fig.…”
Section: Discussionmentioning
confidence: 99%
“…Graphene can be also grown epitaxially on SiC surfaces by high temperature Si sublimation, in ultrahigh vacuum (UHV) [8,9] and in controlled environment [10][11][12][13]. Epitaxial graphene can also be grown on the surfaces of various metals such as Pt [14], Ni [15,16], Ir [17,18], Ru [19][20][21], and Cu [22].…”
Section: Graphene Atomic Structurementioning
confidence: 99%