Comparison of fit accuracy of pressed lithium disilicate inlays fabricated from wax or resin patterns with conventional and CAD-CAM technologies

Abstract

STATEMENT OF PROBLEM The use of resin patterns to produce partial coverage restorations is poorly documented. PURPOSE The purpose of this in vitro study was to compare the marginal and internal fit accuracy of lithium disilicate glass-ceramic inlays obtained from wax or resin patterns and fabricated with digital and conventional techniques. MATERIAL AND METHODS A dentoform mandibular first molar was prepared for a mesio-occlusal ceramic inlay. Six groups of 15 inlays were obtained by conventional impression and manual wax (group CICW) or resin patterns (group CICR); conventional impression, laboratory scanning of the stone die, CAD-CAM milled wax (group CIDW), or polymethylmethacrylate (PMMA) blocks (group CIDR); and scanning of the master preparation with an intraoral scanner, CAD-CAM milled wax (group DSDW), or PMMA blocks (DSDR). The same design was applied to produce the wax and PMMA patterns in the last 4 groups. The replica technique was used to measure marginal and internal fit under stereomicroscopy. Mixed-model ANOVA was applied to assess differences according to the techniques, materials, and discrepancy location (=.05). RESULTS The results demonstrated significant effects of the technique (P<.001), material (P=.009), and discrepancy location (P<.001) on fit measurements. Marginal discrepancy was only affected by the technique (P<.001), with the digital approaches yielding the smallest marginal discrepancy (23.5 ±3.6 m), followed by the conventional digital techniques (31.1 ±5.6 m) and finally by the conventional (42.8 ±7.2 m) techniques. Internal fit was significantly influenced only by the material with lower discrepancy in wax (75.2 ±9.0 m) than in resin patterns (84.7 ±15.1 m). The internal discrepancy was significantly larger than the marginal discrepancy in all groups (P<.001). CONCLUSIONS Inlays generated from conventional wax and resin patterns tend to show higher marginal discrepancies than conventional digital and full digital patterns. Wax and resin materials yield similar marginal fit accuracies irrespective of the impression/manufacturing technique. Better internal fit was shown in wax than in resin patterns, regardless of the technique.

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