2011 3rd Asia Symposium on Quality Electronic Design (ASQED) 2011
DOI: 10.1109/asqed.2011.6111708
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Comparison of isotropic dry etching process using XeF2 and ANisotropic Wet Etching Process using EDP for microhotplate device

Z. Tardan1,
Zaini Abdul Halim
2
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