2017
DOI: 10.1016/j.egypro.2017.09.341
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Comparison of line-wise pl-imaging and area-wise pl-imaging

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Cited by 5 publications
(2 citation statements)
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“…The dataset contains 7300 mc-Si wafers and highperformance multicrystalline silicon (HPMC-Si) [14] wafers with a size of 156 × 156 mm from 74 bricks and 25 boxes of ten different manufacturers. The as-cut wafers were measured with an inline PL system with a line-scan camera with an InGaAs detector, as described by Höffler et al [15] with a resolution of 1024 × 1024 pixels. The samples are processed to passivated emitter and rear cells [16] within an industrial production line.…”
Section: A Datasetmentioning
confidence: 99%
“…The dataset contains 7300 mc-Si wafers and highperformance multicrystalline silicon (HPMC-Si) [14] wafers with a size of 156 × 156 mm from 74 bricks and 25 boxes of ten different manufacturers. The as-cut wafers were measured with an inline PL system with a line-scan camera with an InGaAs detector, as described by Höffler et al [15] with a resolution of 1024 × 1024 pixels. The samples are processed to passivated emitter and rear cells [16] within an industrial production line.…”
Section: A Datasetmentioning
confidence: 99%
“…In particular, line‐scan photoluminescence (PL) and contactless electroluminescence (EL) are increasingly employed for module quality inspection, and both techniques rely on subcell illumination patterns rather than full, homogeneous illumination . Line‐scan PL is designed to measure the luminescence signal from cell regions coincident with the laser, making this technique particularly useful for in‐line screening . However, line‐scan PL images represent cell regions under relative charge extraction conditions, where the photogenerated voltage difference drives carriers out of the illuminated region.…”
mentioning
confidence: 99%