Fe 50 Co 50 and Fe 70 Co 30 (50nm) thin films prepared onto the Silicon (001) substrate at room temperature using UHV DC Magnetron Sputtering (PVD) system. We prepared FeCofilms and characterized their Magnetic, Topographic, Morphology and Elemental analysis using VSM, AFM, FESEM, and EDAX technique respectively. VSM result confirmed both materials are good magnetic in nature and both their Coercivity nearly 200Oe but Fe 50 Co 50 has higher magnetization when compared to Fe 70 Co 30 film. From AFM results, the average roughness and root mean Square ofFe 50 Co 50 film value are double the times higher than Fe 70 Co 30 film. From FESEM result Morphology of the Fe 50 Co 50 film like a columnar structure and Fe 70 Co 30 as like columnar agglomeration structure. EDAX result revels high number of oxygen content present in Fe 70 Co 30 film than Fe 50 Co 50 film as well as no other impurities present in the film.