2021
DOI: 10.3390/ma14195590
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Comparison of the Values of Solar Cell Contact Resistivity Measured with the Transmission Line Method (TLM) and the Potential Difference (PD)

Abstract: This work presents a comparison of values of the contact resistivity of silicon solar cells obtained using the following methods: the transmission line model method (TLM) and the potential difference method (PD). Investigations were performed with two independent scientific units. The samples were manufactured with silver front electrodes. The co-firing process was performed in an infrared belt furnace in a temperature range of 840 to 960 °C. The electrical properties of a batch of solar cells fabricated in tw… Show more

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Cited by 4 publications
(2 citation statements)
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“…Then resistivity of the films decreases with an increase in thickness due to an increase in the carrier concentration in the films. Additionally, according to [41,42] various factors can cause resistance variation, including substrate roughness, the composition and thickness of the silver paste used for electrode deposition, deposition temperature and pressure, surface cleaning and preparation, and the presence of impurities or defects in the substrate. As well, it is possible to find chemical, morphological, and structural modifications in the deposit of films, if there is a variation in deposition temperature because new compounds can be formed, at the time of making the deposit, such as HF or other tin oxide phases (SnO, SnO 3 ) [3].…”
Section: Resultsmentioning
confidence: 99%
“…Then resistivity of the films decreases with an increase in thickness due to an increase in the carrier concentration in the films. Additionally, according to [41,42] various factors can cause resistance variation, including substrate roughness, the composition and thickness of the silver paste used for electrode deposition, deposition temperature and pressure, surface cleaning and preparation, and the presence of impurities or defects in the substrate. As well, it is possible to find chemical, morphological, and structural modifications in the deposit of films, if there is a variation in deposition temperature because new compounds can be formed, at the time of making the deposit, such as HF or other tin oxide phases (SnO, SnO 3 ) [3].…”
Section: Resultsmentioning
confidence: 99%
“…The solder tape was first soaked in flux for 10 min, and, finally, the adhesion between the sintered silicon substrate and the silver film was tested by using a tensile machine. The ohmic contact resistivity between the silicon substrate and the silver film was measured using the rectangular transmission line method (TLM) as shown in Figure 3 [ 22 , 23 ].…”
Section: Methodsmentioning
confidence: 99%