Comparisons on properties and growth mechanisms of carbon nanotubes fabricated by high-pressure and low-pressure plasma-enhanced chemical vapor deposition

Lin, Chao; Lee, Shu Hsing; Hsu, Chao-Yung; Kuo, Chun‐Yan

doi:10.1016/j.diamond.2004.06.033

Cited by 19 publications

(2 citation statements)

References 32 publications

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“…The most successful variants of the structures had a turn-on field of 2.5 V/µm and an effective field enhancement factor β of 6200-7800. The influence of different growth conditions on the emission characteristics of the same arrays of CNTs was shown in [30]. The best result showed that the threshold and turn-on electric fields were 2.48 and 3.98 V/µm, respectively, and the emission current density reached 30 mA/cm 2 .…”

Section: Introductionmentioning

confidence: 99%

“…The literature compares the emission characteristics of CNT arrays obtained under different conditions, with different cathode areas and interelectrode spacing, which makes it difficult to compare them with each other [27][28][29][30][31][32][33][34][35][36][37][38]. Therefore, for a clear comparison of the field emission characteristics of various morphologies of CNT arrays according to a series of criteria, this work presents, for the first time, simple and common morphologies of CNT arrays grown on a silicon substrate by the DC PECVD method in the presence of catalysts.…”

Section: Introductionmentioning

confidence: 99%

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Investigation of Field Emission Properties of Carbon Nanotube Arrays of Different Morphologies

Chumak,

Shchegolkov,

Popov

et al. 2024

Nanomaterials

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This article presents, for the first time, a comparative analysis of the emission characteristics of large-area field-effect cathodes (LAFE) based on carbon nanotubes (CNTs) of various morphologies according to key parameters using a unique computerized technique. The work presents a description of a technology for creating various CNT arrays and their comprehensive structure characterization. All CNT arrays synthesized by the catalytic PECVD method on a silicon substrate showed a high degree of chemical purity under the presented technological conditions. In some cases, nanoisland films of Fe were used as a catalyst; in others, thin films of NiO were used, which were deposited on a silicon wafer by chemical vapor deposition (CVD) and atomic layer deposition (ALD), respectively. As a result of these studies, it turned out that an array with a thick CNT coating has good resistance to the action of strong electric fields, fairly good uniformity of distribution of emission centers, a fairly high selection current (2.88 mA/cm2 at 4.53 V/μm), and compliance with the normal current mode according to the “orthodox” test, which makes the morphology of such structures the most promising for further technological optimization of CNT-based cathodes for various practical applications.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Investigation of Field Emission Properties of Carbon Nanotube Arrays of Different Morphologies

Chumak,

Shchegolkov,

Popov

et al. 2024

Nanomaterials

View full text Add to dashboard Cite

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Plasma‐Assisted Approaches in Inorganic Nanostructure Fabrication

et al. 2010

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Plasma is a unique medium for chemical reactions and materials preparations, which also finds its application in the current tide of nanostructure fabrication. Although plasma-assisted approaches have been long used in thin-film deposition and the top-down scheme of micro-/nanofabrication, fabrication of zero- and one-dimensional inorganic nanostructures through the bottom-up scheme is a relatively new focus of plasma application. In this article, recent plasma-assisted techniques in inorganic zero- and one-dimensional nanostructure fabrication are reviewed, which includes four categories of plasma-assisted approaches: plasma-enhanced chemical vapor deposition, thermal plasma sintering with liquid/solid feeding, thermal plasma evaporation and condensation, and plasma treatment of solids. The special effects and the advantages of plasmas on nanostructure fabrication are illustrated with examples, emphasizing on the understandings and ideas for controlling the growth, structure, and properties during plasma-assisted fabrications. This Review provides insight into the utilization of the special properties of plasmas in nanostructure fabrication.

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