1990
DOI: 10.1051/rphysap:01990002503027700
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Competition between charging and discharging surface reactions as a mechanism for the Fermi-level pinning at semiconductor surfaces

Abstract: 2014 Un nouveau mécanisme de l'accrochage (« pinning ») du niveau de Fermi à la surface des semiconducteurs est proposé. Il est basé sur l'examen de réactions chimiques électriquement actives qui crééent ou détruisent la charge de surface. La neutralisation mutuelle des réactions de charge et décharge conduit à l'accrochage du niveau Fermi. La compensation des écoulements de charges est due à l'inversion du type de conductivité en surface. Dans ce cas le niveau de Fermi est accroché au milieu de la bande inter… Show more

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Cited by 9 publications
(1 citation statement)
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“…The higher value of the threshold voltage of the PL quenching and reduced value of the photocurrent at the reverse bias confirm the assumption of the modified (increased) barriers. The surface/grainboundary charge profile modification can create conditions for pinning of the Fermi level, making it almost temperature independent . In this case, the main thermal quenching of the 3.33 eV line is defined by the detachment of the BE from the defects with the proper E a ∼ 40 meV, as observed in our measurements.…”
Section: Resultssupporting
confidence: 57%
“…The higher value of the threshold voltage of the PL quenching and reduced value of the photocurrent at the reverse bias confirm the assumption of the modified (increased) barriers. The surface/grainboundary charge profile modification can create conditions for pinning of the Fermi level, making it almost temperature independent . In this case, the main thermal quenching of the 3.33 eV line is defined by the detachment of the BE from the defects with the proper E a ∼ 40 meV, as observed in our measurements.…”
Section: Resultssupporting
confidence: 57%