2004
DOI: 10.1088/0960-1317/15/1/005
|View full text |Cite
|
Sign up to set email alerts
|

Composite ferromagnetic photoresist for the fabrication of microelectromechanical systems

Abstract: This paper describes a simple method for the microfabrication of mechanically compliant, magnetically-responsive microstructures. These microstructures were fabricated in one step by using a ferromagnetic photoresist, which, in turn, was prepared by suspending nickel nanospheres in a negative photosensitive epoxy (SU8). The nominal diameter of the nickel nanospheres was 80–150 nm, that is, much smaller than the wavelength of the UV light (365 and 405 nm) used to expose the photoresist. Diffraction and scatteri… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

1
62
2

Year Published

2006
2006
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 91 publications
(65 citation statements)
references
References 20 publications
1
62
2
Order By: Relevance
“…Using a photosensitive polymer in combination with magnetic particles has been reported for the fabrication of microstructures with feature widths larger than 5 m by conventional photolithography using ferromagnetic particles [8,9]. However, when further device miniaturization is desired the processing of composite materials that contain particles dispersed in a matrix becomes a challenge.…”
Section: Introductionmentioning
confidence: 99%
“…Using a photosensitive polymer in combination with magnetic particles has been reported for the fabrication of microstructures with feature widths larger than 5 m by conventional photolithography using ferromagnetic particles [8,9]. However, when further device miniaturization is desired the processing of composite materials that contain particles dispersed in a matrix becomes a challenge.…”
Section: Introductionmentioning
confidence: 99%
“…Several authors have proposed different contributions to this area, coating SU-8 over PCBs for encapsulating microchips [3], as planarization layers [4] and also for microchannel manufacturing [5]. Another remarkable application is the use of conductive SU-8 [6] or ferromagnetic SU-8 [7], making possible an electronic integration of SU-8 and…”
Section: Introductionmentioning
confidence: 99%
“…Using a similar composition, magnetically actuated micromirrors have been fabricated with nickel nanospheres and SU8 photoresist. 20 In contrast to nickel or neodymium particles, magnetite particles are biocompatible which is an essential property needed for working with living cells. There is also a parallel line of research where magnetite particles are mixed with polydimethylsiloxane to fabricate flexible, ferromagnetic polymer structures such as millimeter-sized swimmers 21 and tools.…”
mentioning
confidence: 99%
“…Although magnetite nanoparticles are opaque, standard lithography still works as reflection, scattering and diffraction of light from the particles assist in the proper exposure of the photoresist. 20 The ferromagnetic photoresist was prepared by mixing iron oxide powder ͑spherical, 50 nm in diameter, Alfa Aesar, IL, USA͒ with SU8-25 ͑Micro-Chem, MA, USA͒ in a glass Petri dish until it yielded a homogenous suspension. We waited one hour before using the photoresist to eliminate entrapped air bubbles.…”
mentioning
confidence: 99%
See 1 more Smart Citation