1970
DOI: 10.1016/0040-6090(70)90113-6
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Composition and structure of vapour-deposited cryolite films

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1972
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Cited by 15 publications
(1 citation statement)
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“…In Table 1, fluoride materials were deposited using thermal evaporation at a process pressure in the range of 10 −5 −10 −6 mBar and a deposition rate of 1 Å/s. At higher evaporation rates, fluorides such as cryolite and magnesium fluoride dissociate, causing a high absorption in the coating [27][28][29]. For thermally evaporated fluoride coatings, substrate heating was also required to increase the adhesion of the coating to the substrate.…”
Section: Materials and Fabrication Methodsmentioning
confidence: 99%
“…In Table 1, fluoride materials were deposited using thermal evaporation at a process pressure in the range of 10 −5 −10 −6 mBar and a deposition rate of 1 Å/s. At higher evaporation rates, fluorides such as cryolite and magnesium fluoride dissociate, causing a high absorption in the coating [27][28][29]. For thermally evaporated fluoride coatings, substrate heating was also required to increase the adhesion of the coating to the substrate.…”
Section: Materials and Fabrication Methodsmentioning
confidence: 99%