2004
DOI: 10.1023/b:ruel.0000023928.39077.6f
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Composition, Structure, and Corrosion–Electrochemical Properties of Chromium Coatings Deposited from Chromium(III) Electrolytes Containing Formic Acid and Its Derivatives

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Cited by 28 publications
(5 citation statements)
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“…Vykhodtseva et al 12 observed that an amorphous carbon deposit was formed on a copper cathode during the electrodeposition of chromium from FA-containing baths, as a result of the reduction of FA. Its analysis by X-ray Emission Spectroscopy (XES) showed that it consisted mainly of chromium carbides.…”
Section: Introductionmentioning
confidence: 99%
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“…Vykhodtseva et al 12 observed that an amorphous carbon deposit was formed on a copper cathode during the electrodeposition of chromium from FA-containing baths, as a result of the reduction of FA. Its analysis by X-ray Emission Spectroscopy (XES) showed that it consisted mainly of chromium carbides.…”
Section: Introductionmentioning
confidence: 99%
“…Vykhodtseva et al . observed that an amorphous carbon deposit was formed on a copper cathode during the electrodeposition of chromium from FA‐containing baths, as a result of the reduction of FA.…”
Section: Introductionmentioning
confidence: 99%
“…may be used. [6][7][8][9][10] The most important fact is that Cr(III) does not oxidise organic compounds. Although the pH in the bulk of the electrolyte may be about 1-2, the diffusion layer pH can reach four.…”
Section: Introductionmentioning
confidence: 99%
“…During the 1980s and 1990s, studies were performed on electrodeposition of chromium from trivalent chromium baths, most of which contained carboxylic acids. [23][24][25][26] Electrodeposition by pulse plating has been shown to have advantages over dc plating by producing deposition with reduction of porosity, lower gas content, high purity and deposits having low electrical resistance. [27][28][29][30] Crystalline morphology of the deposits is also controlled by the condition of pulsed electrolysis, [31][32][33][34][35][36][37][38][39][40][41][42][43][44][45] which affects the concentration of ionic species in the vicinity of the substrate for deposition.…”
Section: Introductionmentioning
confidence: 99%