Influence of CH₃SO₃H and AlCl₃ in direct and pulse current electrodeposition of trivalent chromium

Abstract

Comparison of direct and pulse current electrodeposition of the trivalent chromium from urea formic acid as a complexing agent was studied in detail. The influences of CH 3 SO 3 H and AlCl 3 on the properties of the deposit were also studied. The presence of CH 3 SO 3 H exhibits higher current efficiency and better corrosion resistance because of its higher hydrogen overpotential. The pulse current electrodeposition leads to growth of b-Cr. The corrosion studies were conducted by potentiodynamic polarisation and electrochemical impedance spectroscopy. The morphology of the deposits was characterised by scanning electron microscopy (SEM) and X-ray diffraction.

Improving hardness and tribological characteristics of nanocrystalline Cr–C films obtained from Cr(III) plating bath using pulsed electrodeposition

“…Improvement of different properties of Cr electrodeposits has also been reported using pulsed electrolysis [15][16][17][18]. Therefore, the aim of the present work was to study effect of pulsed current deposition on hardness and wear characteristics of Cr-C coatings from Cr(III) bath containing carbamide and formic acid.…”

Voltammetry study of Cr(III)/Cr(II) system in aqueous methanesulfonate solutions

“…Evidently, kinetics of reaction (1) affects to a certain extent the rate of the overall electrochemical process of Cr-electrodeposition. As shown recently [16,17], environment-friendly Cr(III) baths containing methanesulfonic acid (MSA) can be used for chromium electrodeposition. The electroplating baths comprising MSA are known to have many advantages [18].…”

Voltammetry study of Cr(III)/Cr(II) system in methanesulfonate and sulfate solutions: Temperature dependences

“…Because of these advantages, electrochemical systems on the base of MSA and its salts have been shown to be very promising for different electrochemical technologies [28][29][30][31][32][33][34][35][36][37][38][39][40].…”