Compositional investigation of sputtered amorphous SiOX:H

SiOx films prepared using RF magnetron sputtering with a SiO target

“…The deposition rate and a stoichiometry of deposited SiO x films change drastically around the 'transition region' because the target surface reacts with reactive gases. Therefore, it is too difficult to control film stoichiometry minutely using reactive sputtering [16]. The present study employed a SiO ceramic target; the 'transition region' did not exist on the SiO x film deposition.…”

“…All SiO x have a wide non-stoichiometric composition, where x can take a range of values between 0 and 2. Thin films of SiO x have been prepared by vacuum evaporation [1][2][3][4][5]7,8], laser ablation [9,10], sol-gel [11], CVD [6,[12][13][14] and sputtering [15][16][17]. The reactive magnetron sputtering method is a promising technique that is used in applications for coating large areas.…”

Analysis of geometrical effects on the behavior of transverse and longitudinal modes of amorphous silicon compounds

“…[1][2][3] Moreover, the composition and microstructure of nonstoichiometric silicon oxides, nitrides, oxynitrides, and other silicon compounds are frequently measured from the peak frequency, shape, and other features of the infrared bands. [4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] Evaluation of the hydrogen content ͑or other impurities͒ in deposited or grown amorphous layers are routinely determined from the intensity and position of their respective infrared resonances. [20][21][22] Spectral variations are almost always assumed to be due to variations in physical properties of the layers and less frequently in the thicknesses of the layers, angle, and polarization of incident light and multilayer arrangement.…”

The Preparation of Amorphous SixGeyOz Alloy Films by Sputtering. Preparation Conditions, Chemical Composition, and Vibrational Properties

“…First, the transmission spectra were measured in the range from 400 to 4000 cm-' with a spectral resolution of 4 cm-'. The baselines of the absorption-free transmission were calculated under the assumption of coherent multiple reflections and a constant refraction index within the investigated wave-number range [22]. Then the range from 400 to 1400 cm-' was measured with a spectral resolution of 2 cm-I for accurate investigation of the main absorption modes of the films.…”