1994
DOI: 10.1016/0304-8853(94)00257-6
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Compositional microstructures in Co-Cr films for magnetic recording

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Cited by 11 publications
(2 citation statements)
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“…All depositions were performed at room temperature (RT) using a pure Ar pressure of 4 × 10 −1 Pa. It is worth mentioning that our deposition temperature was specifically selected in order to avoid diffusion or segregation effects that commonly occur at elevated temperatures [39,40,41,42,43]. The symmetric (oscillatory) layer structures were deposited by co-sputtering of Co and Cr (Ru) targets keeping the power of Co constant while changing that of the dopant material in order to achieve the intended composition profile.…”
Section: Epitaxial Graded Structuresmentioning
confidence: 99%
“…All depositions were performed at room temperature (RT) using a pure Ar pressure of 4 × 10 −1 Pa. It is worth mentioning that our deposition temperature was specifically selected in order to avoid diffusion or segregation effects that commonly occur at elevated temperatures [39,40,41,42,43]. The symmetric (oscillatory) layer structures were deposited by co-sputtering of Co and Cr (Ru) targets keeping the power of Co constant while changing that of the dopant material in order to achieve the intended composition profile.…”
Section: Epitaxial Graded Structuresmentioning
confidence: 99%
“…. Cr, whose content is about 10-20 at%, is observed to segregate at the grain boundaries and inside the grains [1]. The compositional separation is the main reason for the reduction of intergranular interaction, which causes the coercivity to increase.…”
Section: Introductionmentioning
confidence: 99%