1999
DOI: 10.1016/s0304-8853(98)00412-0
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The influence of tantalum content in relation to substrate temperature on magnetic and structural properties of Co–Cr–Ta thin films

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Cited by 9 publications
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“…The Cr underlayer was deposited at substrate temperature of 2501C and Ar pressure of 3 Â 10 À2 mbar. The Co-Cr-Ta layer was deposited at 2001C and Ar pressure of 2 Â 10 À2 mbar [1,2]. Corning glass has been used as substrates for all samples.…”
mentioning
confidence: 99%
“…The Cr underlayer was deposited at substrate temperature of 2501C and Ar pressure of 3 Â 10 À2 mbar. The Co-Cr-Ta layer was deposited at 2001C and Ar pressure of 2 Â 10 À2 mbar [1,2]. Corning glass has been used as substrates for all samples.…”
mentioning
confidence: 99%