Computation lithography: virtual reality and virtual virtuality

Lam, Edmund Y.; Wong, Alfred K. K.

doi:10.1364/oe.17.012259

Cited by 53 publications

(38 citation statements)

References 36 publications

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“…To enhance the calculation efficiency, a numerical method named singular value decomposition (SVD) [4] are early proposed to decompose the eq. (1) to the summation of eigenvalues and eigenvector multiplication [5,6,7] that is…”

Section: Methodsmentioning

confidence: 99%

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

2010

SPIE Proceedings

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Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.

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Section: Methodsmentioning

confidence: 99%

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

2010

SPIE Proceedings

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“…With the rapid development of virtual reality, head mounted 3D virtual reality glasses become more and more popular because of its rich vision effect [1][2][3] . This device is to install screen in the helmet or head wear, then the screen display the image or video of the same scene, when using the optical element to see the display hardware, The retina of each eye receives a 2D projection of the 3D world from slightly different perspectives, from which the brain reconstructs a 3D experience with illusion of depth [4][5] .…”

Section: Introductionmentioning

confidence: 99%

Design and fabrication of concave-convex lens for head mounted virtual reality 3D glasses

Deng

Cheng

et al. 2015

SPIE Proceedings

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As a kind of light-weighted and convenient tool to achieve stereoscopic vision, virtual reality glasses are gaining more popularity nowadays. For these glasses, molded plastic lenses are often adopted to handle both the imaging property and the cost of massive production. However, the as-built performance of the glass depends on both the optical design and the injection molding process, and maintaining the profile of the lens during injection molding process presents particular challenges. In this paper, optical design is combined with processing simulation analysis to obtain a design result suitable for injection molding. Based on the design and analysis results, different experiments are done using high-quality equipment to optimize the process parameters of injection molding. Finally, a single concave-convex lens is designed with a field-of-view of 90° for the virtual reality 3D glasses. The as-built profile error of the glass lens is controlled within 5μm, which indicates that the designed shape of the lens is fairly realized and the designed optical performance can thus be achieved.

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“…16,17 Meanwhile, Poonawala and Milanfar designed the model-based optical proximity correction system and introduced the steepest descent algorithm for the optimization framework. 18,19 Subsequently, the optimization framework was further generalized for phase-shifting masks 20,21 and partially coherent imaging systems, [22][23][24][25][26] and the optimization algorithm was improved with an active set method 21 and with an augmented Lagrangian method. 27 Most recently, Lv et al further improved the computational efficiency of the mask synthesis by using the conjugate gradient and an optimal iterative step, 28 and by introducing a mask filtering technique to enhance the regularity of the synthesized mask pattern.…”

Section: Introductionmentioning

confidence: 99%

“…Also, most recently we developed a metric called edge distance error (EDE) to guide mask synthesis. 29,30 Compared to the commonly used metric pattern error, [16][17][18][19][20][21][22][23][24][25][26][27][28] the metric EDE has a dimension of length and is independent of the simulation grid size. The analytical circle-sampling technique and EDE are both independent of grid size.…”

Section: Introductionmentioning

confidence: 99%

Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography

Lam

Wei

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Robust inverse mask synthesis is computationally intensive, and its turnaround time continues to rise hand-in-hand with the ever-shrinking integrated circuit feature size. We report the development of a cascadic multigrid (CMG) algorithm for robust inverse mask synthesis, which starts from a relatively coarse mask grid and refines it iteratively in stages, so as to achieve significant speedup without compromising numerical accuracy. Since the CMG algorithm entails frequent changes of the computational grid size, we need to intentionally introduce an analytical circle-sampling technique for modeling the forward lithography imaging and employ an edge distance error as metric to guide mask synthesis. These two techniques work nicely with variable grid sizes and are well suited for our CMG algorithm. As a result, our algorithm achieves more than four times speedup over conventional methods that synthesize a mask on a fixed fine grid. Numerical results are presented to demonstrate the validity and efficiency of the proposed method. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Computation lithography: virtual reality and virtual virtuality

Cited by 53 publications

References 36 publications

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Design and fabrication of concave-convex lens for head mounted virtual reality 3D glasses

Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography

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