2018
DOI: 10.1016/j.electacta.2018.04.062
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Computational analysis and experimental evidence of two typical levelers for acid copper electroplating

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Cited by 72 publications
(28 citation statements)
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“…According to previous research, high electron density regions (e. g., N=N of JGB) have strong coordination and adsorption capability to the copper surface. [13] This region could offer electrons to the lowenergy empty molecular orbitals of copper to form a coordinate/covalent bond, [15,52] which indicated that the carbonyl region of 1 e was the probable adsorption site for the adsorption of 1 e on the copper surface.…”
Section: Resultsmentioning
confidence: 99%
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“…According to previous research, high electron density regions (e. g., N=N of JGB) have strong coordination and adsorption capability to the copper surface. [13] This region could offer electrons to the lowenergy empty molecular orbitals of copper to form a coordinate/covalent bond, [15,52] which indicated that the carbonyl region of 1 e was the probable adsorption site for the adsorption of 1 e on the copper surface.…”
Section: Resultsmentioning
confidence: 99%
“…[13,14] Recent studies showed that JGB only had an antagonistic effect with SPS, which will result in the thin knee, at high current density electroplating. [15] The quaternary ammonium salts, being proved as effective levelling agent, have been widely reported. [11,[16][17][18] During the electrodeposition process, the cationic quaternary ammoniums ionized in aqueous solution could easily reach to the cathode surface and adsorb to suppress copper electrodeposition process.…”
Section: Introductionmentioning
confidence: 99%
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“…Geometry optimizations were carried out by density functional theory (DFT) using B3LYP functional with the 6-311G+(d.p) basis set. 44 The frontier molecular orbital energies and energy gap of PBDGE were calculated and considered. These parameters were used to further elaborate the mechanism of interaction between PBDGE and copper surface.…”
Section: ■ Methodsmentioning
confidence: 99%
“…Electroplating is another common method for realizing the metallization of insulating surface meanwhile thickening the conductive patterns . Electroplating has become the most important step in the fabrication process of electronic components, printed circuit boards, and semiconductor industries due to its inherently low cost, high-throughput, and high stability. However, compared with metal surface, the polymers have a very low surface energy, leading to a low wettability of the plating solution on the polymer substrates. , Consequently, the plated metal film on the polymer is scattered and irregular with poor surface coverage. Furthermore, the interfacial adhesion of metal/polymer composites decreases with the increase of the thickness of the plated films due to the different atomic arrangements of the two adjacent layers .…”
Section: Introductionmentioning
confidence: 99%