Computational characterization of electron-beam-sustained plasma

Huang, Jia-long; Wang, Chi; Chang, Lijie; Zhang, Ya; Wang, Zhebin; Yi, Lin; Jiang, Wei

doi:10.1063/1.5091466

Cited by 7 publications

(6 citation statements)

References 53 publications

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“…Here, the 1D implicit PIC/MCC method is used to simulate the axial influences of plasma modulated by IB injection. The algorithm has been reported previously [26][27][28][29][30], and we have used the code successfully in many different and related research like electron beam generated plasma [31].…”

Section: Physics Model and Simulation Methodsmentioning

confidence: 99%

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Zhou¹,

Wang²,

Wu³

et al. 2022

Plasma Sources Sci. Technol.

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This work proposes to use the Ar+ ion beam (IB) injection to modulate the properties of the single-frequency capacitively coupled plasma (CCP). The particle-in-cell/Monte Carlo collisions (PIC/MCC) method is used to simulate the plasma characteristics after the IB (2 keV, 0.5A) is injected into the discharge area from the grounded electrode. The results show that the IB can effectively increase the plasma density, reduce the electron energy, increase the self-bias voltage, and thus increase ion flux and broaden the ion energy distribution function on the electrode. Furthermore, transition from $\alpha$-mode to $\gamma$-mode occurs by increasing the secondary electron emission coefficient γ and discharge pressure. In general, the IB injection can be used as a complementary tool to control the plasma properties of CCP.

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Section: Physics Model and Simulation Methodsmentioning

confidence: 99%

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Zhou¹,

Wang²,

Wu³

et al. 2022

Plasma Sources Sci. Technol.

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“…As a classic structure driven by EB generated from the hollow cathode, the Large-Area Plasma Processing System (LAPPS) has been developed by the Naval Research Laboratory (NRL) [31][32][33]. LAPPS offers several advantages, including: (a) high plasma density (10 10 ∼ 10 12 cm −3 ); (b) low electron temperature (T e < 1 eV); (c) uniform plasma distribution over a large area (exceeding 1 m 2 ); (d) low ion energy (<5 eV) on the substrate; (e) low plasma potential [34]; (f) independent control of ion and radical fluxes. In recent years, Boris and coauthors [35] have conducted research on plasma generated by EB in argon and SF 6 mixtures using Langmuir probes and plasma resonance spectroscopy, confirming the effectiveness of these systems in the generation of ion-ion plasmas.…”

Section: Introductionmentioning

confidence: 99%

Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection

Zhou,

Wang,

et al. 2024

Phys. Scr.

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The modulated approach of electron beam (EB) injection can achieve favorable parameters for capacitive coupled plasmas(CCP). In this work, a one-dimensional particle-in-cell/Monte Carlo collision (PIC/MCC) model is used to simulate the stable dual-frequency (DF) CCP with EB injection. First, when the parameters of EB are kept constant at 0.01 A and 30 eV, the results demonstrate significant enhancements in electron density, self-bias voltage, and ion flux. Furthermore, the EEPF appears to have a transition from a typical bi-Maxwellian distribution to a Maxwellian distribution, and the dominant heating mode shifts from the α-mode to the α-γ-mode. Secondly, when the EB current and energy are all changed, the basic parameters of DF-CCP can be achieved by different modulations. Furthermore, we also discuss the transition of the electron heating mode as the current increases from 0.001 A to 1 A and the energy increases from 10 eV to 490 eV. In particular, we conduct a comparative study among different cases of EB injection. According to these results, the modulation capability of EB injection in DF-CCP is thoroughly investigated, which can greatly benefit atom-scale etching in practical applications.

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“…Levko and Raja examined the influence of SF 6 addition to Ar on the stability of electron beam driven discharge using a 1D PIC model [26]. Huang et al described a 1D PIC model for an electron beam plasma [27]. They found that the EED is Druyvesteynlike with a high energy tail.…”

Section: Introductionmentioning

confidence: 99%

Particle-in-cell modeling of electron beam generated plasma

Rauf

Sydorenko

Jubin

et al. 2023

Plasma Sources Sci. Technol.

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Plasmas generated using energetic electron beams are well known for their low electron temperature (Te) and plasma potential, which makes them attractive for atomic-precision plasma processing applications such as atomic layer etch and deposition. A 2-dimensional particle-in-cell (PIC) model for an electron beam-generated plasma in Argon confined by a constant applied magnetic field is described in this article. Plasma production primarily occurs in the path of the beam electrons in the center of the chamber. The resulting plasma spreads out in the chamber through non-ambipolar diffusion with a short-circuit effect allowing unequal electron and ion fluxes to different regions of the bounding conductive chamber walls. The cross-field transport of the electrons (and thus the steady-state characteristics of the plasma) are strongly impacted by the magnetic field. Te is anisotropic in the electron beam region, but low and isotropic away from the plasma production zone. The plasma density increases, and the plasma becomes more confined near the region of production when the magnetic field strengthens. The magnetic field reduces both electron physical and energy transport perpendicular to the magnetic field. Te is uniform along the magnetic field lines and slowly decreases perpendicular to it. Electrons are less energetic in the sheath regions where the sheath electric field repels and confines the low-energy electrons from the bulk plasma. Even though electron and ion densities are similar in the bulk plasma due to quasi-neutrality, electron and ion fluxes on the grounded chamber walls are unequal at most locations. Electron confinement by the magnetic field weakens with increasing pressure, and the plasma spread out farther from the electron beam region.

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Computational characterization of electron-beam-sustained plasma

Cited by 7 publications

References 53 publications

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection

Particle-in-cell modeling of electron beam generated plasma

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