Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Abstract

This work proposes to use the Ar+ ion beam (IB) injection to modulate the properties of the single-frequency capacitively coupled plasma (CCP). The particle-in-cell/Monte Carlo collisions (PIC/MCC) method is used to simulate the plasma characteristics after the IB (2 keV, 0.5A) is injected into the discharge area from the grounded electrode. The results show that the IB can effectively increase the plasma density, reduce the electron energy, increase the self-bias voltage, and thus increase ion flux and broaden the ion energy distribution function on the electrode. Furthermore, transition from $\alpha$-mode to $\gamma$-mode occurs by increasing the secondary electron emission coefficient γ and discharge pressure. In general, the IB injection can be used as a complementary tool to control the plasma properties of CCP.

Numerical characterization of capacitively coupled CF4 plasmas modulated by anion beam injection

“…Although the physical model allows for ion beam generation under laboratory conditions, this paper primarily focuses on In this computational process, only the entire discharge region after the energetic ions pass through the small holes of the gridded electrode is considered, as shown in figure 1. This physical model is similar to the structure of the device proposed in Ar CCP with IB and EB injection [19,21]. The gridded electrode in the physical schematic of the FB CCP system is utilized to inject the ion beam, similar to gridded ion acceleration [20].…”

“…In this study, our team developed an open source 1D3V PIC/MC code [22], developed in Fortran code, to investigate the gas discharge process CF 4 . This code has been completed in series work, such as the breakdown process of CF 4 /SF 6 RF-CCP [23,24] and Ar dual-frequency (DF) CCP [25], MAE of CF 4 RF-CCP [17], IB RF-CCP [19] and EB RF-CCP [21].…”

“…Previously, Zhou et al theoretically proposed a new feasible approach to modulate electropositive CCP (Ar) with ion (Ar + ) beam injection (IB), which can enhance the γ mode by ioninduced secondary electrons to achieve modulation of plasma density, self-bias, electron energy, and other parameters [19]. Energetic IB can be provided by plasma generators and ion acceleration [20].…”

Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection

“…Modulation schemes to control the characteristic parameters of CCP mainly include dual-frequency (DF) or multi-frequency CCP [1,[5][6][7][8][9][10][11][12][13], hybrid CCP [14][15][16][17][18], external magnetic fields [19,20], electron beam (EB) injection CCP [21][22][23][24][25][26][27][28][29], and ion beam injection [30]. Recently, EB-driven approaches have gained considerable attention.…”