Computational Nanopatterning in the Plasmonic Metamaterials for Diffraction Limit

Abstract

For technologies beyond diffraction limit, the plasmonic nanolithography can produce subwavelength structures using the broad beam illumination of the standard photoresist with the visible light. In this study, for the nano-pattern formation, the polarization effects of the transverse magnetic (TM) mode and the transverse electric (TE) mode about diffraction limit and plasmonic phenomena are described on basis of simulation results through the sub-wavelength aperture. TM mode is degraded in diffraction effects but enhanced in plasmonic effects due to the change distribution on the metallic surface and the waveguide resonances in slits. For the confidence of simulation results, those results are compared with experiment results of the pyramidal horn with mirror. For the contact lithography, it is shown that the resolution of plasmonic metamaterial masks is enhanced larger than that of the conventional mask by using a multi-layer method.