Computer simulation of nano-pore formation in EB-PVD thermal barrier coatings

Yoshiya, Masato; Wada, Kunihiko; Jang, Byung-Koog; Matsubara, Hideaki

doi:10.1016/j.surfcoat.2004.03.056

Cited by 15 publications

(10 citation statements)

References 31 publications

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“…The formation of the pores in Fig. 4(c) can be related with the deviation of the columnar growth direction from the incident direction [21]. When the incident direction is inclined to one side, columns on this side receive more flux than columns on the other side, since the surface is parallel to the substrate.…”

Section: Resultsmentioning

confidence: 99%

Influence of incidence angle and distance on the structure of aluminium nitride films prepared by reactive magnetron sputtering

You

Kim

2007

Thin Solid Films

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Section: Resultsmentioning

confidence: 99%

Influence of incidence angle and distance on the structure of aluminium nitride films prepared by reactive magnetron sputtering

You

Kim

2007

Thin Solid Films

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“…Grazing incidence of the deposition species often results in a porous, columnar film with inferior mechanical properties, numerous examples of which exist in the literature. See for example Yoshiya et al [175] and Alami et al [7] for recent Monte Carlo simulation studies and microscopy studies, respectively.…”

Section: Guiding Of Materials Flux and Selective Depositionmentioning

confidence: 99%

Ionized physical vapor deposition (IPVD): A review of technology and applications

et al. 2006

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In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film growth can hardly be exaggerated. Ion bombardment is an important physical tool available to materials scientists in the design of new materials and new structures. Glow discharges and in particular the magnetron sputtering discharge have the advantage that the ions of the discharge are abundantly available to the deposition process. However, the ion chemistry is usually dominated by the ions of the inert sputtering gas while ions of the sputtered material are rare. Over the past few years, various ionized sputtering techniques have appeared that can achieve a high degree of ionization of the sputtered atoms, often up to 50 % but in some cases as much as approximately 90%. This opens a complete new perspective in the engineering and design of new thin film materials. The development and application of magnetron sputtering systems for ionized physical vapor deposition (IPVD) is reviewed. The application of a secondary discharge, inductively coupled plasma

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“…The study was focused on the influence of such an important coating parameter as the nanolayer period λ on a cluster and hierarchical structure using an example of the Ti-TiN-(Ti,Cr,Al)N coating with a nanostructured wear-resistant layer (Figure 8). For a coating with λ = 10 nm (Figure 8a), there is a formation of hierarchical feather-like structures, modeled and described, in particular, in [19,20,[24][25][26] for various techniques of the coating deposition. While a coating is being deposited, there in an obvious increase in the cluster size.…”

Section: Influence Of the Nanolayer Period λ On The Cluster And Hierarchical Coating Structurementioning

confidence: 99%

“…The results of the study focused on the development of a columnar coating structure have proved that the average distance between columns first increases sharply and then stabilizes due to cessation of the growth and regeneration of the structure. The Monte Carlo methods were applied for 2D modeling of the process of micropore formation in a coating, given the stochastic nature of the process [20]. Approaches of computational fluid dynamics were also applied, they give a much rougher description of the process, but at the same time contribute to a noticeable reduction in the amount of calculations, thus making it possible to introduce modeling in the 3D geometry with high-scale detailing [21,22].…”

Section: Introductionmentioning

confidence: 99%

Convection–Diffusion Model for the Synthesis of PVD Coatings and the Influence of Nanolayer Parameters on the Formation of Fractal and Hierarchical Structures

Vereschaka¹,

Grigoriev

Чигарев

et al. 2020

Coatings

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The study proposes a model for the deposition of coatings, which takes into account the stochastic nature of the deposition process and is built considering the influence of the parallel convection and diffusion processes. The investigation has found that the dispersion of the motion direction of deposited particles in front of a substrate increases, which indicates a growth of the randomness in the trajectories of the particles being deposited. The obtained formulas indicate the fractal nature of the deposition process. During the formation of the multilayer coating structure, mismatched fractal structures of the layers overlap each other and thus the clustering effect is largely leveled out. The value of the nanolayer λ period has a significant influence on the fractal structure of the coating and the formation of feather-like hierarchical structures in it.

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Computer simulation of nano-pore formation in EB-PVD thermal barrier coatings

Cited by 15 publications

References 31 publications

Influence of incidence angle and distance on the structure of aluminium nitride films prepared by reactive magnetron sputtering

Influence of incidence angle and distance on the structure of aluminium nitride films prepared by reactive magnetron sputtering

Ionized physical vapor deposition (IPVD): A review of technology and applications

Convection–Diffusion Model for the Synthesis of PVD Coatings and the Influence of Nanolayer Parameters on the Formation of Fractal and Hierarchical Structures

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