Computer simulation of Talbot phenomenon using the Fresnel integrals approach

Goloborodko, Andrey A.

doi:10.1016/j.ijleo.2016.01.175

Cited by 17 publications

(5 citation statements)

References 13 publications

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“…According to Ref. [6], for amplitude grating appropriate results, from the point of view of error between calculated and measured images, are obtained for lateral step size of 5µm. Therefore, all following simulation results are calculated based on lateral step size of 5µm, as it mentioned in Ref.…”

Section: Simulations and Discussionmentioning

confidence: 99%

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Aberration measurements by a Talbot wavefront sensor in the presence of intensity variations

Kotov¹,

Danko²,

Goloborodko³

2023

J. Opt. Soc. Am. B

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Paper deals with the theoretical investigations of measurement accuracy of optical aberrations by Talbot wavefront sensor in the presence of random amplitude variations. Theoretical prediction of intensity distribution for gratings of any type based on their spatial spectrum is obtained, and it is shown that grating is fully restored in Talbot plane even for the high fraction of random amplitude. The possibilities of self-imaging phenomenon is investigated based on the simulation results. Simulation results show that pit displacement error increases when the correlation length decreases or when grating spatial spectrum increases. It is found that for defocus aberration intensity variations decrease measured defocus value and increment of aberrations of same order (oblique and vertical astigmatisms).

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Section: Simulations and Discussionmentioning

confidence: 99%

“…Therefore, all following simulation results are calculated based on lateral step size of 5µm, as it mentioned in Ref. [6]. even in the presence of high level of amplitude noise.…”

Section: Simulations and Discussionmentioning

confidence: 99%

Aberration measurements by a Talbot wavefront sensor in the presence of intensity variations

Kotov¹,

Danko²,

Goloborodko³

2023

J. Opt. Soc. Am. B

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“…Since the organic molecular system will change or be random with the change of the data, the experimental results of the real system data and the model will often be changed. Using sequence analysis method, as shown in Figure 2 The ab initio calculation method is to build a model of the research object through a computer [13][14]. Through the electronic structure and electronic behavior of different atoms in the established model, the Schrodinger equation is analyzed for the atoms and molecules in the model, and some approximations are used.…”

Section: Computer Simulation Methods Design and Organic Functional Mo...mentioning

confidence: 99%

Computer Simulation and Design of Organic Functional Molecules for New Energy Materials

2020

IJBDIT

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New energy materials are materials that support the development of new energy, have energy storage and conversion functions, or materials that integrate structure and function. This material can increase the investment and operation of new energy systems. The focus is mainly on the research process of material design through physical research. The proposal of this technology can save the use of non-renewable resources, and its performance exceeds the traditional meaning. New energy is mainly based on new technologies and new materials to make energy renewable, and through utilization and development, limited resources can form a cycle. This article aims to study the use of computer simulations and the design of organic functional molecules for new energy materials, observe the difference between new energy materials and traditional materials through these two technologies, and obtain their characteristics through the analysis of this new energy material. The analysis of these theories is finally applied to practice. In this article, a related introduction to a process and design of computer simulation is proposed, and then combined with the analysis of organic functional molecules, through the derivation of formulas and related data, the motion properties of the relevant molecules of new energy materials are obtained, and the new energy materials are further understood. Energy materials, through quantification and data presentation, it can be concluded from experiments and analysis that the molecular tension of new energy materials is related to various factors.

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“…A numerical implementation of this analytical solution by use of the Fresnel integrals approach for a finite square From these three parameters, the monochromatic Talbot distance Z T , the achromatic Talbot distance Z A , and the maximum exposed distance Z max are calculated. array of apertures was recently reported [25]. This algorithm was coded in MATLAB and can be tailored to any geometry by dialing in the pitch and size of the apertures, and the size of the array of apertures.…”

Section: Simulationmentioning

confidence: 99%

Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

Fallica

2019

Advanced Optical Technologies

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There are a growing number of applications where three-dimensional patterning is needed for the fabrication of micro- and nanostructures. Thus far, grayscale lithography is the main technique for obtaining a thickness gradient in a resist material that is exploited for pattern transfer by anisotropic etch. However, truly three-dimensional structures can only be produced by unconventional lithography methods such as direct laser writing, focused ion beam electrodeposition, colloidal sphere lithography, and tilted multiple-pass projection lithography, but at the cost of remarkable complexity and lengthiness. In this work, the three-dimensional shape of light, which is formed by Talbot effect diffraction, was exploited to produce inherently three-dimensional patterns in a photosensitive polymer. Using light in the soft X-ray wavelength, periodic three-dimensional structures of lateral period 600 nm were obtained. The position at which the sample has to be located to be in the Fresnel regime was simulated using an analytical implementation of the Fresnel integrals approach. Exploiting the light shape forming in diffraction effects thus enables the patterning of high-resolution three-dimensional nanostructures over a large area and with a single exposure pass – which would be otherwise impossible with conventional lithographic methods.

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Computer simulation of Talbot phenomenon using the Fresnel integrals approach

Cited by 17 publications

References 13 publications

Aberration measurements by a Talbot wavefront sensor in the presence of intensity variations

Aberration measurements by a Talbot wavefront sensor in the presence of intensity variations

Computer Simulation and Design of Organic Functional Molecules for New Energy Materials

Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

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