2002
DOI: 10.1016/s0022-3093(01)01016-x
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Conductance fluctuations in undoped hydrogenated amorphous silicon–germanium alloy thin films

Abstract: We report coplanar conductance fluctuations of device quality, undoped hydrogenated amorphous silicon-germanium alloy thin films (a-SiGe:H) measured from 430 to 490 K. The a-SiGe:H alloys produce noise power spectra similar to coplanar undoped a-Si:H films in the same temperature range. The noise power spectrum S n does not fit a single 1=f a power law but rather has two distinct regions, each accurately fitted by a power law, but with different slopes. The low frequency slope a 1 is similar to that observed i… Show more

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Cited by 5 publications
(3 citation statements)
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“…The slope and quadratic dependence on dc bias current remained the same for all spectra. The spectra obtained for this sample contrast with those previously measured for amorphous and microcrystalline silicon thin films where a distinct break in the power law produced two frequency ranges with different slope [9][10][11]. The higher frequency region with a lower slope parameter of about 0.60 was interpreted as a second independent noise source in the material.…”
Section: Resultscontrasting
confidence: 87%
See 1 more Smart Citation
“…The slope and quadratic dependence on dc bias current remained the same for all spectra. The spectra obtained for this sample contrast with those previously measured for amorphous and microcrystalline silicon thin films where a distinct break in the power law produced two frequency ranges with different slope [9][10][11]. The higher frequency region with a lower slope parameter of about 0.60 was interpreted as a second independent noise source in the material.…”
Section: Resultscontrasting
confidence: 87%
“…Noise spectra from amorphous and microcrystalline materials often show unusual features [9][10][11]. To date, there have been no measurements of noise spectra in air-exposed µc-Si:H. This paper reports the changes in dark conductivity and 1/f noise that occur upon air aging and annealing for a state-of-theart µc-Si:H. Measurements were carried out shortly after deposition and again after aging two year in air in order to study irreversible changes.…”
Section: Introductionmentioning
confidence: 99%
“…A range of values from 10 -6 to 10 -1 have been reported for Hooge's parameter for semiconductor films or layers and for the conducting channels of JFET's and HEMT's at low electric fields [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21][22][23] . Typical values are 10 -4 which is consistent with the doping levels and number of atoms in these materials, Eqn.…”
Section: Discussionmentioning
confidence: 99%