“…It is known that the resistive switching in the oxide layer of MDM structures underlying the memory device operation is usually provided by the mobility of anionic (V O ) vacancies [21,25,27,[29][30][31][33][34][35], ions of impurity metals [19-21, 25, 26, 28, 35-37] or Zr + [17,30,38] in the active layer under an external electric field. The electrical resistance of the memristor in low-resistance (LRS), high-resistance (HRS) and intermediate states are governed by the thickness and imperfection of the dioxide layer [24,26,30,33,34,39]. In this case, one of the most probable mechanisms of resistive switching in as-grown ZrO 2 -based structures is the chainordering of V O vacancies followed by the formation of conductive channels or filaments between metal contacts.…”