Conductive Atomic Force Microscopy for Nanolithography Based on Local Anodic Oxidation

Lorenzoni, Matteo; Pérez‐Murano, F.

doi:10.1002/9783527699773.ch9

Cited by 2 publications

(3 citation statements)

References 52 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Although conductive AFM (c-AFM) is a suitable method to measure the electrical properties of individual structures [14], it is very time consuming and it cannot be used to characterize complete integrated circuits. Nevertheless, the methodology that we present here is interesting for contacting single pillars in complex integrated circuits, in combination with standard fabrication methods.…”

Section: Contacting By Afm Nano-indentationmentioning

confidence: 99%

Exploring Strategies to Contact 3D Nano-Pillars

et al. 2020

Self Cite

View full text Add to dashboard Cite

This contribution explores different strategies to electrically contact vertical pillars with diameters less than 100 nm. Two process strategies have been defined, the first based on Atomic Force Microscope (AFM) indentation and the second based on planarization and reactive ion etching (RIE). We have demonstrated that both proposals provide suitable contacts. The results help to conclude that the most feasible strategy to be implementable is the one using planarization and reactive ion etching since it is more suitable for parallel and/or high-volume manufacturing processing.

show abstract

Section: Contacting By Afm Nano-indentationmentioning

confidence: 99%

Exploring Strategies to Contact 3D Nano-Pillars

et al. 2020

Self Cite

View full text Add to dashboard Cite

show abstract

“…In addition, Kelvin probe force microscopy (KPFM) measurements were conducted in the dark to study the local surface potential of the films (Figure S12). The contact potential difference (CPD) refers to the potential difference between the surface of the sample being tested and the probe, which denoted as CPD = W tip − W sample e , where W tip and W sample represent the work function (WF) of the tip and the sample, respectively . By subtracting the measured CPD value from the tip’s work function, the work function of the sample can be estimated. , As shown in the insets of Figure d–f, the line profile of the films indicates an increase of CPD values from 330 to 540 and then to 600 mV for the control, PHPA, and PHPA+PFOA film, respectively.…”

mentioning

confidence: 99%

“…where W tip and W sample represent the work function (WF) of the tip and the sample, respectively. 39 By subtracting the measured CPD value from the tip's work function, the work function of the sample can be estimated. 40,41 As shown in the insets of Figure 2d−f, the line profile of the films indicates an increase of CPD values from 330 to 540 and then to 600 mV for the control, PHPA, and PHPA+PFOA film, respectively.…”

mentioning

confidence: 99%

Defect Management and Ion Infiltration Barrier Enable High-Performance Perovskite Solar Cells

Liu,

Wang,

et al. 2024

ACS Energy Lett.

View full text Add to dashboard Cite

The stability of perovskite solar cells (PSCs) has been considered as one of the major obstacles toward practical application. Defects in the perovskite layer and ion infiltration from the hole transport layer (HTL) can trigger degradation of n-i-p PSCs. Herein, phenylhydrazine-4-sulfonic acid (PHPA) was employed as an additive to modulate perovskite crystallization during film formation, enlarging the perovskite crystal grain sizes to ∼3 μm. Density functional theory (DFT) calculations revealed that PHPA could effectively inhibit the formation of iodine vacancies (V I ) and passivate the under-coordinated Pb 2+ ions. Additionally, perfluorooctanoic acid (PFOA) was adopted to passivate the surface located dangling Pb 2+ defects, improve the surface hydrophobicity, and inhibit Li + ion migration from the HTL to the bottom perovskite, thus enhancing the device's environmental and operational stability. Consequently, the resulting devices delivered a champion efficiency of 25.1% with an excellent maximum-power-point (MPP) tracking stability.

show abstract

Conductive Atomic Force Microscopy for Nanolithography Based on Local Anodic Oxidation

Cited by 2 publications

References 52 publications

Exploring Strategies to Contact 3D Nano-Pillars

Exploring Strategies to Contact 3D Nano-Pillars

Defect Management and Ion Infiltration Barrier Enable High-Performance Perovskite Solar Cells

Contact Info

Product

Resources

About