“…Indeed, the common strategies used to control rough surface topographies at the nanoscale consist of physical processes based on lithography and physical vapor deposition techniques, chemical processes, including etching, oxidation, etc., and self-assembly of nano objects . Among all these procedures, only a few techniques may lead to successful roughening with almost homogeneous chemical composition, such as supersonic cluster beam deposition (SCBD) and glancing angle deposition (GLAD). , Accordingly, decoupling topography from surface chemistry remains experimentally rare. − Third, and more decisively, the choice of the relevant parameters, which provide a quantitative description of the surface morphology is not obvious. In situations with common occurrence, surfaces of metals and oxides exhibit random topographies, which may be fully described by a n -point height probability distribution p n ({( x i , y i )} i =1,..., n ;{ z i } i =1,..., n ) such that p n .d z 1 ···d z n gives the probability that the heights z n of the surface at n points of lateral coordinates ( x n , y n ) are simultaneously comprised between z i and z i + d z i , respectively.…”