2006
DOI: 10.1016/j.geomorph.2005.06.006
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Considerations on the chronological and causal relationships between talus flatirons and palaeoclimatic changes in central and northeastern Spain

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Cited by 30 publications
(36 citation statements)
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References 47 publications
(53 reference statements)
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“…The development of talus flatirons in arid environments involves phase of deposition and buildup and a phase of incision and erosion followed by cliff and talus flatiron retreat (Koons, 1955;Gerson, 1982;Gerson and Grossman, 1987;Schmidt, 1989;Gutiérrez et al, 2006). According to many studies, the main cause for talus flatiron detachment Fig.…”
Section: The Conceptual Model Of Talus Flatiron Formation In Hyperarimentioning
confidence: 99%
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“…The development of talus flatirons in arid environments involves phase of deposition and buildup and a phase of incision and erosion followed by cliff and talus flatiron retreat (Koons, 1955;Gerson, 1982;Gerson and Grossman, 1987;Schmidt, 1989;Gutiérrez et al, 2006). According to many studies, the main cause for talus flatiron detachment Fig.…”
Section: The Conceptual Model Of Talus Flatiron Formation In Hyperarimentioning
confidence: 99%
“…Accepted models suggest that in arid and semiarid areas talus flatiron generations represent the response of cliff slopes to climatic cycles (Everard, 1963;Gerson, 1982;Gerson and Grossman, 1987;Sancho et al, 1988;Bull, 1991;Schmidt, 1996;Arauzo et al, 1996;Gutiérrez et al, 1998Gutiérrez et al, , 2006. Gerson (1982) suggested that a cliff capped by durable rock in arid regions is subjected, through time, to two long term geomorphic processes: (a) under arid to semiarid conditions (100-350 mm yr − 1 ) relatively smooth continuous talus deposits accumulate at the foot of the cliff, mainly by debris and slope-wash, and (b) under arid to extremely arid conditions (10-100 mm yr − 1 ) slope wash and gullying occur and results in the detachment of talus deposits from the source cliff.…”
Section: Paleoclimatic Significance Of Talus Flatiron Formationmentioning
confidence: 99%
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