Constrained shrinking of nanoimprinted pre-stressed polymer films to achieve programmable, high-resolution, miniaturized nanopatterns

Sayed, Shady; Selvaganapathy, P. Ravi

doi:10.1088/1361-6528/ac244d

Cited by 2 publications

(1 citation statement)

References 29 publications

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“…This results in a significant reduction in the height of the imprinted patterns, which accordingly tend to disappear. We have developed a miniaturization approach that controls the polymer reflow and preserves the topographical features after shrinking by mechanically constraining the film during the shrinking process 22 . The film is mechanically constrained in one direction, which allows the release of the stresses only in the orthogonal direction while minimizing the change in height of the imprinted features.…”

Section: Introductionmentioning

confidence: 99%

High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking

Sayed

Selvaganapathy

2022

Microsyst Nanoeng

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The fabrication of nanostructures and nanopatterns is of crucial importance in microelectronics, nanofluidics, and the manufacture of biomedical devices and biosensors. However, the creation of nanopatterns by means of conventional nanofabrication techniques such as electron beam lithography is expensive and time-consuming. Here, we develop a multistep miniaturization approach using prestressed polymer films to generate nanopatterns from microscale patterns without the need of complex nanolithography methods. Prestressed polymer films have been used as a miniaturization technique to fabricate features with a smaller size than the initial imprinted features. However, the height of the imprinted features is significantly reduced after the thermal shrinking of the prestressed films due to the shape memory effect of the polymer, and as a result, the topographical features tend to disappear after shrinking. We have developed a miniaturization approach that controls the material flow and maintains the shrunken patterns by applying mechanical constraints during the shrinking process. The combination of hot embossing and constrained shrinking makes it possible to reduce the size of the initial imprinted features even to the nanoscale. The developed multistep miniaturization approach allows using the shrunken pattern as a master for a subsequent miniaturization cycle. Well-defined patterns as small as 100 nm are fabricated, showing a 10-fold reduction in size from the original master. The developed approach also allows the transfer of the shrunken polymeric patterns to a silicon substrate, which can be used as a functional substrate for many applications or directly as a master for nanoimprint lithography.

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Section: Introductionmentioning

confidence: 99%

High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking

Sayed

Selvaganapathy

2022

Microsyst Nanoeng

Self Cite

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Nanofabrication of nanostructure lattices: from high-quality large patterns to precise hybrid units

Ma,

Zhang,

Sutherland

et al. 2024

Int. J. Extrem. Manuf.

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Sub-wavelength nanostructure lattices provide versatile platforms for light control and the basis for various novel phenomena and applications in physics, material science, chemistry, biology, and energy. The thriving study of nanostructure lattices is building on the remarkable progress of nanofabrication techniques, especially for the possibility of fabricating larger-area patterns while achieving higher-quality lattices, complex shapes, and hybrid materials units. In this review, we present a comprehensive review of techniques for large-area fabrication of optical nanostructure arrays, encompassing direct writing, self-assembly, controllable growth, and nanoimprint/print methods. Furthermore, a particular focus is made on the recent improvement of unit accuracy and diversity, leading to integrated and multifunctional structures for devices and applications.

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Constrained shrinking of nanoimprinted pre-stressed polymer films to achieve programmable, high-resolution, miniaturized nanopatterns

Cited by 2 publications

References 29 publications

High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking

High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking

Nanofabrication of nanostructure lattices: from high-quality large patterns to precise hybrid units

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