2021
DOI: 10.1016/j.jallcom.2021.158748
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Constructing ultrathin TiO2 protection layers via atomic layer deposition for stable lithium metal anode cycling

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Cited by 38 publications
(22 citation statements)
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“…Other materials such as ZnO and Ti 2 O 3 oxide layers have demonstrated similar transport mechanism as Al 2 O 3 . [96,108] In summary, the experimental results discussed supported that fact that Al 2 O 3 has the tendency to diffuse the lithium ion flux and lower the nucleation barrier via lithiumaluminum lithiation process. The physical resiliency of Al 2 O 3 thin film has the ability to constrain dendrite growth.…”
Section: Metal Oxidessupporting
confidence: 62%
See 1 more Smart Citation
“…Other materials such as ZnO and Ti 2 O 3 oxide layers have demonstrated similar transport mechanism as Al 2 O 3 . [96,108] In summary, the experimental results discussed supported that fact that Al 2 O 3 has the tendency to diffuse the lithium ion flux and lower the nucleation barrier via lithiumaluminum lithiation process. The physical resiliency of Al 2 O 3 thin film has the ability to constrain dendrite growth.…”
Section: Metal Oxidessupporting
confidence: 62%
“…Wang et al constructed an ultrathin TiO 2 (5 nm) using ALD technique. [108] After 100 cycles at 0.5 C charge-discharge current density, the Li/TiO 2 ||NCM622 full-cell demonstrated superior rate performance and long-cycle performance, with capacity retention increased by 23.3% compared to the unmodified cell. Similar to Al 2 O 3 , TiO 2 also displays lithiation behaviors.…”
Section: Metal Oxidesmentioning
confidence: 92%
“…Bare LCO (BLCO) powders were purchased from Tianjin Guoan Mengguli ( D 50 = 14.2 μm, initial discharge capacity at 4.5 V = 187 mA h g –1 ), which were able to be stably cycled at 4.35 V through a trace amount of Al doping (0.32 wt %). The ALD device applied in this work was a fully self-designed MINI-4TALD system (Zhejiang Qiyue Technology Co., Ltd.) with a 4-inch round work platform and up to 350 °C deposition temperatures, which was already successfully applied in previous works for different coating materials. ALD was applied to coat LCO powders using trimethylaluminum (TMA) and H 2 O as precursors in a self-designed reactor, and the deposition temperature was set to be 150 °C. Each ALD cycle included five steps: (1) pulsing of the water precursors within 0.1 s, (2) purging of residues by nitrogen within 10 s, (3) pulsing of the TMA precursors within 0.1 s, (4) purging of residues by nitrogen within 10 s, and (5) removing all gases and residual reactants by vacuum within 15 s. The coating samples with different thicknesses were obtained by repeating the above steps for 8 (CLCO 8), 40 (CLCO 40), and 80 cycles (CLCO 80), and approximately 1 nm alumina can be deposited every eight cycles.…”
Section: Experimental Sectionmentioning
confidence: 99%
“…Li coated with a 5 nm (50 ALD cycles) TiO 2 film has also demonstrated significant improvements in air stability, cycling stability, and rate capability [ 92 ]. After 8 h of air exposure, most of the TiO 2 -protected Li surface maintained its initial silver-white color with only some local areas displaying signs of tarnish while bare Li was completely corroded.…”
Section: Surface Modifications On Alkali Metals Via Aldmentioning
confidence: 99%