Contact angle of a nanodrop on a nanorough solid surface

Berim, Gersh O.; Ruckenstein, Eli

doi:10.1039/c4nr06591c

Cited by 15 publications

(10 citation statements)

References 18 publications

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“…These results can be explained by the increase in the surface roughness of the PSA ber by the air plasma, as evidenced by the AFM images, and Wenzel and Cassie theories. 32 It can also be attributed to the introduction of some new polar groups onto the ber surface as shown by the XPS analysis. These reasons improved the PSA ber surface wettability.…”

Section: Surface Chemical Compositionmentioning

confidence: 96%

Surface modification of polysulfonamide fiber treated by air plasma

et al. 2015

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Section: Surface Chemical Compositionmentioning

confidence: 96%

Surface modification of polysulfonamide fiber treated by air plasma

et al. 2015

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“…In all cases, the magnitudes of the contact angles decrease with increasing drop size. In previous papers [1,18] in which a drop in contact of the liquid-solid interactions. In the system considered in the present paper, the drop has no direct contact with the solid and the molecules of TF do not interact with the solid (ǫ 2,s = 0).…”

Section: Nanoscale Accepted Manuscriptmentioning

confidence: 99%

“…In all cases, the magnitudes of the contact angles decrease with increasing drop size. In previous papers 1,18 in which a drop in contact with a rough surface was considered, such a dependence of the contact angle was explained by the change of the location of the leading edges of the drop with respect to the potential of the liquid-solid interactions. In the system considered in the present paper, the drop has no direct contact with the solid and the molecules of TF do not interact with the solid (ε 2,S = 0).…”

Section: Contact Anglementioning

confidence: 99%

A nanodrop on the surface of a lubricating liquid covering a rough solid surface

Berim

Ruckenstein

2015

Nanoscale

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A two-component fluid consisting of a lubricating fluid (LF) that covers a rough solid surface (surface decorated by periodic array of identical pillars) and a test fluid (TF) as a nanodrop over LF is considered. A horizontal external perturbative force is applied to TF and the density functional theory is used for the treatment of the system. The concepts of advancing and receding contact angles as well as of leading edges of the drop are revisited. Three different definitions of the contact angles are analyzed and the most plausible selected. The contact angles are calculated as functions of drop size and magnitude of the perturbative force. For small drops, both angles change nonmonotonously with increasing perturbative force. For larger drops, the advancing contact angle has the tendency to increase and the receding contact angle to decrease with increasing force. The sticking force which maintains the drop equilibrium in the presence of an external perturbative force is determined as function of the contact angles. It is shown that this dependence is similar to that for a drop on a rough solid surface in the absence of LF. A critical sticking force, defined as the largest value of the perturbative force for which the drop remains at equilibrium, is determined.

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“…Anisotropic etching of silicon in alkali metal hydroxides aqueous solutions (e.g., KOH) is an important technology in micromachining [ 1 ]. Micro- and nano-structures on substrate have been widely applied in solar cells, superhydrophobic surface and plasmonics [ 2 , 3 , 4 , 5 , 6 ]. Different applications require the features at a different shape and size range.…”

Section: Introductionmentioning

confidence: 99%

Two-Layer Microstructures Fabricated by One-Step Anisotropic Wet Etching of Si in KOH Solution

et al. 2016

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Anisotropic etching of silicon in potassium hydroxide (KOH) is an important technology in micromachining. The residue deposition from KOH etching of Si is typically regarded as a disadvantage of this technology. In this report, we make use of this residue as a second masking layer to fabricate two-layer complex structures. Square patterns with size in the range of 15–150 μm and gap distance of 5 μm have been designed and tested. The residue masking layer appears when the substrate is over-etched in hydrofluoric acid (HF) solution over a threshold. The two-layer structures of micropyramids surrounded by wall-like structures are obtained according to the two different masking layers of SiO2 and residue. The residue masking layer is stable and can survive over KOH etching for long time to achieve deep Si etching. The process parameters of etchant concentration, temperature, etching time and pattern size have been investigated. With well-controlled two-layer structures, useful structures could be designed for applications in plasmonic and microfluidic devices in the future.

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Contact angle of a nanodrop on a nanorough solid surface

Cited by 15 publications

References 18 publications

Surface modification of polysulfonamide fiber treated by air plasma

Surface modification of polysulfonamide fiber treated by air plasma

A nanodrop on the surface of a lubricating liquid covering a rough solid surface

Two-Layer Microstructures Fabricated by One-Step Anisotropic Wet Etching of Si in KOH Solution

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