Continuous Deposition of Organo‐Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire‐Cylinder Configuration

Vandenabeele, Cédric; Maurau, Rémy; Bulou, Simon; Siffer, Frédéric; Gérard, Mathieu; Belmonte, T.; Choquet, Patrick

doi:10.1002/ppap.201400098

Cited by 7 publications

(16 citation statements)

References 29 publications

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“…Based on our previous works, 31 in which we show that increasing the power leads to a reduction of hydrocarbons content in the thin film that becomes more and more inorganic, it seems that the plasma layer has to keep some chemical groups, for example, unsaturated hydrocarbons, to allow cross-linking between the organochlorinated coating and the rubber.…”

Section: Resultsmentioning

confidence: 98%

“…31 For instance, at 10 W, the measured dynamical deposition rate is 0.42 nm m s −1 . Therefore, the linear speed has to be adjusted at 0.56 cm s −1 to obtain a 75 nm-thick thin film.…”

Section: Methodsmentioning

confidence: 99%

“…The interest and the feasibility of such a treatment are described in a previous paper. 31 The main conclusions drawn from this previous work are that, by carefully setting the plasma parameters, defect-free coatings, homogeneous in thickness and composition, can be deposited in a dynamic mode on several meters of metallic filament, with dynamical deposition rates ranging from 0.4 to 1.2 nm m s −1 . The hydrogen content in the layer is shown to decrease when the power injected into the discharge increases, leading to a more and more inorganic thin film, resembling more carbon black or even graphite than hydrocarbons.…”

Section: Introductionmentioning

confidence: 98%

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Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

Vandenabeele

Bulou

Maurau

et al. 2015

ACS Appl. Mater. Interfaces

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A continuous-flow plasma process working at atmospheric pressure is developed to enhance the adhesion between a rubber compound and a zinc-plated steel monofilament, with the long-term objective to find a potential alternative to the electrolytic brass plating process, which is currently used in tire industry. For this purpose, a highly efficient tubular dielectric barrier discharge reactor is built to allow the continuous treatment of "endless" cylindrical substrates. The best treatment conditions found regarding adhesion are Ar/O2 plasma pretreatment, followed by the deposition from dichloromethane of a 75 nm-thick organo-chlorinated plasma polymerized thin film. Ar/O2 pretreatment allows the removal of organic residues, coming from drawing lubricants, and induces external growth of zinc oxide. The plasma layer has to be preferably deposited at low power to conserve sufficient hydrocarbon moieties. Surface analyses reveal the complex chemical mechanism behind the establishment of strong adhesion levels, more than five times higher after the plasma treatment. During the vulcanization step, superficial ZnO reacts with the chlorinated species of the thin film and is converted into porous and granular bump-shaped ZnwOxHyClz nanostructures. Together, rubber additives diffuse through the plasma layer and lead to the formation of zinc sulfide on the substrate surface. Hence, two distinct interfaces, rubber/thin film and thin film/substrate, are established. On the basis of these observations, hypotheses explaining the high bonding strength results are formulated.

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Section: Resultsmentioning

confidence: 98%

“…31 For instance, at 10 W, the measured dynamical deposition rate is 0.42 nm m s −1 . Therefore, the linear speed has to be adjusted at 0.56 cm s −1 to obtain a 75 nm-thick thin film.…”

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 98%

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Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

Vandenabeele

Bulou

Maurau

et al. 2015

ACS Appl. Mater. Interfaces

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“…Among the DBD sources, the possibility of continuously treating yarns or wires appeared recently with the tubular dielectric barrier discharge . Such a device is designed to let the wire come in and get out of the reactor without contact with the surrounding air, thanks to a gas curtain.…”

Section: Developing Enabling Technology For Plasma Sources and Processesmentioning

confidence: 99%

White paper on the future of plasma science and technology in plastics and textiles

Cvelbar

Walsh

Černák

et al. 2018

Plasma Processes & Polymers

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Authors are listed in an order by their first contribution part to this paper and its subsections. Some have contributed to more than one subsection. This white paper considers the future of plasma science and technology related to the manufacturing and modifications of plastics and textiles, summarizing existing efforts and the current state-of-art for major topics related to plasma processing techniques. It draws on the frontier of plasma technologies in order to see beyond and identify the grand challenges which we face in the following 5-10 years. To progress and move the frontier forward, the paper highlights the major enabling technologies

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“…Over the last few years, atmospheric pressure plasmas have begun to be studied for the deposition of chlorinated films [7,8]. Atmospheric plasmas fed with C 4 Cl 6 or C 2 H 2 Cl 4 can produce stable chlorinated films [7].…”

Section: Introductionmentioning

confidence: 99%

Characterization of amorphous hydrogenated chlorinated plasma polymers

Rossi

Schreiner

Durrant

2016

Surface and Coatings Technology

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Thin films were produced by plasma enhanced chemical vapor deposition from propanol-chloroform-argon mixtures. The main system parameter studied was the percentage of chloroform in the chamber feed, C Cl. Plasma polymers doped with chlorine were produced at deposition rates of up to 110 nm min −1. As revealed by infraredand X-ray photoelectron spectroscopy, the films consisted of a hydrogenated carbon matrix with a carbon content of at least 80 at.%, and a roughly constant oxygen content of about 12 at.%. A maximum chlorine content of~8 at.% was obtained. The surface contact angle of the films was around 75°, and was reduced slightly at greater chlorine contents. Optical properties were obtained from ultraviolet-visible-near infrared spectroscopic data. While the refractive index of the films was around 1.56 independently of C Cl , the chlorinated films showed a distinct optical gap of~2.5 eV compared to~1.9 eV for the unchlorinated film.

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Continuous Deposition of Organo‐Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire‐Cylinder Configuration

Abstract: International audienc

Cited by 7 publications

References 29 publications

Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

White paper on the future of plasma science and technology in plastics and textiles

Characterization of amorphous hydrogenated chlorinated plasma polymers

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