Continuous Flow Supercritical Chemical Fluid Deposition of Optoelectronic Quality CdS

Retracted: Synthesis of Cu2ZnSnS4 Micro‐ and Nanoparticles via a Continuous‐Flow Supercritical Carbon Dioxide Process

“…Yang et al reported a similar marginal sulfur deficiency when depositing polycrystalline CdS thin films in a continuous-flow sc-CO 2 system due to the higher vapor pressure of S compared to the metal in the supercritical system. [14] The sulfur deficiency observed in the present work is consistent with this explanation.…”

Chemical routes to chalcogenide materials as thin films or particles with critical dimensions with the order of nanometres

“…[ More recently, [Cd(S 2 CNHexyl 2 ) 2 ] has been used in supercritical chemical fluid deposition experiments to deposit optoelectronic quality hexagonal CdS films. 58 Initial experiments gave sulfur deficient films (up to 10%). The production of stoichiometric CdS films needed an additional sulfur source, butane-1-thiol was included.…”

“…An Fig. 3 Variable temperature photoluminescence spectra of supercritical fluid deposited CdS films with a 30 meV FWHM at 2.9 K. 58 investigation into the decomposition mechanisms of these compounds by GC-MS and EI-MS showed that the formation of selenium during decomposition of the precursor and growth is inhibited in such compounds. 62 Little is known about the stability of N-alkyldithiocarbamato species which probably arises from their different chemical reactivity and lower stability than their N,N-dialkylated counterparts.…”

Cadmium Sulfide and Cadmium Phosphide Thin Films from a Single Cadmium Compound

“…A recent evolution in this methodology involved supercritical-fluid CVD with hexyl dithiocarbamate and demonstrated the deposition of high-quality, near-stoichiometric, CdS films. 2 Mixed chalcogenide compounds for thin films of more complex structures have received scant attention. We recently showed that dichalcogenoimidodiphosphinato compounds of nickel, [Ni-{ i Pr 2 P(X1)NP(X2) i Pr 2 } 2 ] (X1 = S, X2 = Se, X1 = X2 = S, and X1 = X2 = Se), can be used to deposit thin films of nickel sulfide, selenide, or phosphide, 3,4 dependent upon both the temperature and method of deposition.…”

“…Substrates have ranged from glass to oriented single crystals, with the latter often acting as templates for epitaxy. A recent evolution in this methodology involved supercritical-fluid CVD with hexyl dithiocarbamate and demonstrated the deposition of high-quality, near-stoichiometric, CdS films …”