2007
DOI: 10.1080/02786820701694355
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Continuous Generation of TiO2Nanoparticles by an Atmospheric Pressure Plasma-Enhanced Process

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Cited by 27 publications
(23 citation statements)
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“…Based on very conservative assumptions, we adopted the experimental data to assess the potential exposure risk in CB plants due to workers who may be exposed to part of CB-NPs. Therefore, we reconstructed the TiO 2 -NP concentration of continuous generation in a manufacturing laboratory (Chen et al 2007) while CB-NP concentration during forklift use in CB plants (Kuhlbusch et al 2004). …”
Section: Exposure Analysis In the Workplacementioning
confidence: 99%
See 1 more Smart Citation
“…Based on very conservative assumptions, we adopted the experimental data to assess the potential exposure risk in CB plants due to workers who may be exposed to part of CB-NPs. Therefore, we reconstructed the TiO 2 -NP concentration of continuous generation in a manufacturing laboratory (Chen et al 2007) while CB-NP concentration during forklift use in CB plants (Kuhlbusch et al 2004). …”
Section: Exposure Analysis In the Workplacementioning
confidence: 99%
“…NP concentrations and size distribution data were obtained from a TiO 2 -NP manufacturing laboratory and a CB plant from studies by Chen et al (2007) and Kuhlbusch et al (2004), respectively. Chen et al (2007) reported a method for the continuous generation of TiO 2 -NPs by dielectric barrier discharge process and measured the number size distribution in the production process in a manufacturing laboratory. Kuhlbusch et al (2004) measured the NPs of number size distributions during forklift operation near the sampling instrumentation that workers may be exposed to in the bag filling areas in CB plants.…”
Section: Exposure Analysis In the Workplacementioning
confidence: 99%
“…has been considered to be one of the most promising plasma-assisted technologies for plasma chemical synthesis (Alexandrov 2005;Barankin 2006;Chen 2007;McIlroy 2003;Moravej 2004;Zhu 1990). This type of plasma technology is characterized by approximately three times higher partial pressures of precursors in comparison to low-pressure processes and because of this reason, it is expected to provide sufficiently higher rate of chemical reaction.…”
Section: Introductionmentioning
confidence: 99%
“…The maximum difference of the inferred spatial potential distributions is 5% at the distance up to 10 cm. Therefore the potential pattern along the reaction chamber axis in the downstream area can be accurately described by the expression (10).…”
Section: Aip Advances 4 107130 (2014)mentioning
confidence: 99%
“…15,16 The applications of atmospheric pressure (AP) discharges conducted at radio frequency (RF) are of high interest due to several advantages, for instance, (i) the convenience of use and the simplicity of hardware design; (ii) high concentrations of precursors in the vapor phase and, as consequence, high product yield; (iii) low thermal input to the substrate due to intrinsic low-temperature nature. A particular feature of AP plasma-assisted processes is that homogeneous reactions promote the nanoparticle formation, [9][10][11] which then can build self-assembled structures.…”
Section: Introductionmentioning
confidence: 99%