Continuous photolithography system and technology for fiber substrate

Abstract

Thispaper presents novel continuous photolithography technology and system as well for fiber substrate. The newly-developed system mainly consists of spray coating and three-dimensional (3D) UV exposure units. Thin and uniform resist film is successfully prepared on fiber substrates and thus the photolithography results were improved much. It is noteworthy that thin resist film could be formed on 125 μm-in-diameter fiber even without rotation, suggesting that the spray coating technology has attractive prospects. With the 3D photolithography system, fine patterns of resist down to 20 μm line width are successfully formed on the 125 μm-in-diameter fiber.

Continuous Process for Large-Area Flexible MEMS

“…Here a new 3-D photolithography technology for a high-resolution micro-patterning process on a fiber substrate is introduced. The proposed technology mainly comprises the micro-fabrication of the 3-D exposure module and the spray deposition of thin resist films on the fiber [3]. The 3-D exposure module is successfully prepared by the wet etching of a quartz substrate and the projection exposure method.…”

3D mask modules using two-photon direct laser writingtechnology for continuous lithography process on fibers

“…In our previous works [5][6][7], we have suggested a 3D mask module technology for the high resolution micromachining process on the fibers. Figure 1 shows schematic of the 3D mask module technology.…”

“…1, lift-off process is used for the formation of metal patterns. A roll-to-roll 3D exposure system has been already introduced in our previous work [6]. As a result, mass production of fine patterns can be possible on the fibers in the stepping-forward mode.…”

“…Projection photolithography method is utilized in our previous work [5][6]. The state-of-the-art of projection lithography has the resolution of 6 ~ 7 μm and the depth of focus of about 50 ~ 70 μm.…”