2003
DOI: 10.1016/j.physb.2003.09.196
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Contribution of the disturbed dislocation slip planes to the electrical properties of plastically deformed silicon

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Cited by 27 publications
(33 citation statements)
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“…This is almost the threshold temperature for dislocation nucleation and movement in Si. As is well known [9,10], a high density of point defects can be expected due to a movement of dislocations at such low temperature. Therefore, the observed short time constants can probably be a consequence of intensive recombination via point defects.…”
mentioning
confidence: 90%
“…This is almost the threshold temperature for dislocation nucleation and movement in Si. As is well known [9,10], a high density of point defects can be expected due to a movement of dislocations at such low temperature. Therefore, the observed short time constants can probably be a consequence of intensive recombination via point defects.…”
mentioning
confidence: 90%
“…The oxygen gettering in the A-type samples was simulated based on the model of randomly distributed dislocation traces [7,8], which were considered as perfect oxygen traps. We have found that the kinetics is strongly non-exponential in this case (at least until oxygen concentration is above 10% of the initial value).…”
Section: Ageing Kinetics It Is Found That All Samples Of the Same Typmentioning
confidence: 99%
“…• C [7] and can be revealed by their recombination activity even in the samples with individual dislocations [8]. These defects could also be assumed to serve as centers for oxygen aggregation.…”
mentioning
confidence: 99%
“…Moreover, in Si with a low dislocation density deformed at low temperatures the effect of deformation-induced defects on the electrical properties is mainly determined not by dislocations themselves but by the dislocation trails [3,4]. It was shown [4] that the EBIC contrast of dislocation trails was rather high even in crystals deformed in clean conditions, in which the dislocation EBIC contrast practically disappeared.…”
mentioning
confidence: 99%