“…Of particular interest is the nature of the adsorbate-substrate interaction since its strength is one factor which controls the electron flow in a molecular-based device. 9,10 Among the molecule-surface systems of interest from this perspective, the thiophene (C 4 H 4 S) on a metal surface such as Cu (111) is an appealing choice since thiophene is a basic functional unit of oligothiophene used to build, for instance, a molecular field effect transistor 11 or molecular wires on the NaCl/Cu(111) system. 12 From the experimental point of view, thiophene molecules adsorbed on the Cu(111) surface have been investigated by Milligan et al, 13,14 Imanishi et al, 15 and Rousseau et al 16 In these normal incidence x-ray standing wave (NIXSW), near edge x-ray absorption fine structure (NEXAFS), and temperature programmed desorption (TPD) measurements, the focus was on the details of the ground-state geometry such as the adsorption site, the molecule-surface distance, and the tilt angle of the thiophene molecules for different coverages as well as on the corresponding adsorption energy.…”