Herein, the example of the most typical electrochromic material, namely WO 3 , is used to illustrate the potential of electrochromic materials for controlling infrared reflectance and hence, emissivity. Playing with various growth parameters, contrast in reflectance between the inserted H x WO 3 and deinserted WO 3 states as high as 73% in mid-wavelength band (MW, 3-5 μm) was achieved for 320 nm WO 3 films. The latter electrochromic materials were radio frequency sputtered on Au substrate at ambient temperature in 6 Pa of chamber pressure. In comparison, for long wavelength band (LW,(8)(9)(10)(11)(12), the contrast in reflectance did not exceed 30%. The origins of the various electrochromic behaviours are correlated to the film structure, morphology and composition, indicating better properties for porous, nonstoichiometric films.