“…In many cases, the interface imperfections are responsible for subsequent device problems, e.g., shortening of operation time and decreasing of radiated intensity. The structure and composition of the interface and the bulk structure of ZnSe/GaAs have been studied by a number of physical and chemical methods, e.g., high-resolution x-ray diffraction ͑HRXRD͒, 10 photoluminescence ͑PL͒, 7,10,11 reflection high energy electron diffraction ͑RHEED͒, 4,8,9 transmission electron microscopy ͑TEM͒, 12,13 scanning tunneling microscopy ͑STM͒, 14 and extended x-ray absorption fine structure ͑EXAFS͒. 15 Our research effort aims to investigate the bulk structure of ZnSe films grown by MBE on ͓001͔ GaAs substrates and the ZnSe/GaAs interface by means of x-ray reflectivity.…”