2001
DOI: 10.1063/1.1361239
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Control of the well-type radial potential profile in the magnetized plasma flow produced by a dc discharge

Abstract: The control of the well-type radial potential profile in a dc plasma by applying bias potential, VE, to the end plate is investigated experimentally. The experimental evidence that a plasma space potential, Φp, increases at the circumference of the plasma with the increase of VE is interpreted qualitatively by the experimental results of the current drawn by the segmented end plate, and of the relationship of Φp to VE. For the dc discharge the value of Φp at the center of the plasma is naturally settled on the… Show more

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Cited by 4 publications
(2 citation statements)
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“…See, for example, the data presented in figure 2 of [2], or the schematic drawing in figure 2(b). Double sheaths can form in several circumstances including the presence of ion beams [3], applied magnetic fields [4], or as a result of non-local effects such as global balance of electron and ion currents lost from a plasma [2]. In this paper we report that double sheaths and anode spots can sometimes be present in combination as well.…”
Section: Introductionmentioning
confidence: 75%
“…See, for example, the data presented in figure 2 of [2], or the schematic drawing in figure 2(b). Double sheaths can form in several circumstances including the presence of ion beams [3], applied magnetic fields [4], or as a result of non-local effects such as global balance of electron and ion currents lost from a plasma [2]. In this paper we report that double sheaths and anode spots can sometimes be present in combination as well.…”
Section: Introductionmentioning
confidence: 75%
“…Generally, a well-type radial potential profile is formed in magnetized sheet or cylindrical plasmas generated by a dc arc discharge. 22 Since the electric field due to the potential well may force the negative ions to the peripheral region, it is necessary to investigate the transport effect by considering the effect of electric field.…”
Section: Introductionmentioning
confidence: 99%