Controllable growth of electrodeposited single-crystal nanowire arrays: The examples of metal Ni and semiconductor ZnS

Growth and characterization of highly oriented CuBr thin films through room temperature electrochemical route

“…(2) Electrodeposition on an inert substrate. In this situation, the epitaxial influence of the substrate is absent and the preferred orientation of the electrodeposits is determined by the electrocrystallization conditions or surface energy of the deposits [25,26]. Here, the ITO substrate is random oriented polycrystal thin film and then the ITO substrate should be excluded as a factor to determine the orientation of the electrodeposited CuBr thin films.…”

Orientation Growth and Magnetic Properties of Electrochemical Deposited Nickel Nanowire Arrays

“…This ion adsorption can decrease the surface energy, making it even lower than the pristine low-surface-energy facet (such as (111) plane). In the end, the growth of Ni nanowire arrays is along the [110] direction [18,38]. We did not observe the nanowire arrays with other orientations in the studied current density range; nevertheless, it is anticipated that other orientations could be obtained by changing the surface energy order of different facets, which can be achieved by selecting a suitable current density and surface absorbent.…”

“…The nucleation and growth kinetics of the nanowire arrays in one-dimensional confined geometry can be tuned by different experimental parameters, including template dimension, electrolyte properties (pH value, composition, additive, and so on), reaction temperature, applied voltage, and the current density [14][15][16][17]. In our previous work, we demonstrated that current density can influence the growth direction and crystalline quality of electrodeposited semiconductor nanowire arrays, and further change their photoluminescence properties [18,19].…”

Electrodeposition and optical properties of highly oriented γ-CuI thin films

“…(2) Electrodeposition on an inert substrate. In this situation, the epitaxial influence of the substrate is absent and the preferred orientation of the electrodeposits is determined by electrocrystallization conditions or surface energy of the deposits [23,24]. Here, the ITO substrate is the randomly oriented polycrystal thin film and the ITO substrate should be excluded as a factor to determine the orientation of the electrodeposited CuI thin films.…”