2016
DOI: 10.1007/s12541-016-0115-8
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Controlled airbrush coating of polymer resists in Roll-to-Roll nanoimprinting with regimented residual layer thickness

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Cited by 20 publications
(13 citation statements)
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“…Airbrushing can provide one promising solution for continuous and uniform resin coating over a large-area substrate, prior to feeding it to the mold-contacting zone in UV NIL. Koo et al demonstrated the uniform airbrushing of UV-curable resin on a substrate that was continuously fed to the R2R UV NIL [ 162 ]. Controlling the resin concentration and airbrushing conditions can enable residual layer-controlled R2R NIL in a continuous manner without resorting to spin-coating or other non-continuous resin coating methods [ 163 ].…”
Section: Printing Methodsmentioning
confidence: 99%
“…Airbrushing can provide one promising solution for continuous and uniform resin coating over a large-area substrate, prior to feeding it to the mold-contacting zone in UV NIL. Koo et al demonstrated the uniform airbrushing of UV-curable resin on a substrate that was continuously fed to the R2R UV NIL [ 162 ]. Controlling the resin concentration and airbrushing conditions can enable residual layer-controlled R2R NIL in a continuous manner without resorting to spin-coating or other non-continuous resin coating methods [ 163 ].…”
Section: Printing Methodsmentioning
confidence: 99%
“…Figure 1A describes the rollto-roll imprinting process on the PET film. First, we wrapped a cylindrical roll with an imprinting mold for stamping nanoarchitecture on the PET film coated with UV-curable polymer resin using an airbrush coating process (Koo et al, 2016). As the resin-coated PET films pass through the cylindrical roller, UV light cures the imprinted film at the outlet.…”
Section: Resultsmentioning
confidence: 99%
“…Au LSPR strip was fabricated using roll-to-roll nanoimprint lithography (Koo et al, 2016;Wi et al, 2017). First, nanograting structures were fabricated with polyurethane acrylate (PUA) on PET film using a 200 nm-pitch and 100 nm-height silicon master.…”
Section: Au Lspr Strip Fabricationmentioning
confidence: 99%
“…Notably, this is valid as long as the resin concentration is within a proper range; too thick resin causes an uneven surface while too thin resin cannot form a continuous thin film after PGMEA is dried. In our case, an adequate concentration range of SSQ for making uniform thin films and later well-imprinted patterns is found to be between 5 and 10 wt% [12]. We focus on the two cases, 5 and 10 wt% with maximum propellant air pressure of 0.15 MPa, for parametric investigations hereafter, unless otherwise specified.
Fig.
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Section: Resultsmentioning
confidence: 99%
“…A UV-curable polymeric resin is diluted in a volatile solvent for smooth flowing, which is airbrushed over the substrate to leave a uniform thin resin film behind. This quick process is well-suited to the continuous and high-speed R2R NIL; we first review that a uniform nanoscale line (nanograting) pattern can be faithfully fabricated by conducting R2R NIL with a flexible nanograting mold onto the airbrushed resin films based on our previous work [ 12 ]. By modulating the resin concentration and airbrushing time, the initial thin film thickness as well as the residual layer thickness (RLT) of the nanopatterns created by R2R NIL can be readily controlled.…”
Section: Introductionmentioning
confidence: 99%