2020
DOI: 10.1016/j.mtadv.2020.100098
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Controlled growth of atomically thin transition metal dichalcogenides via chemical vapor deposition method

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Cited by 40 publications
(37 citation statements)
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“…More specifically, top‐down methods mainly include micromechanical exfoliation and liquid phase exfoliation methods, [ 15,33–42 ] while bottom‐up methods generally include chemical vapor deposition (CVD) and hydrothermal/solvothermal methods. [ 43–53 ]…”
Section: Synthesis and Optoelectronic Properties Of 2d Materials And ...mentioning
confidence: 99%
“…More specifically, top‐down methods mainly include micromechanical exfoliation and liquid phase exfoliation methods, [ 15,33–42 ] while bottom‐up methods generally include chemical vapor deposition (CVD) and hydrothermal/solvothermal methods. [ 43–53 ]…”
Section: Synthesis and Optoelectronic Properties Of 2d Materials And ...mentioning
confidence: 99%
“…The second path is to sulfurize/selenize/tellurize the predeposited metal or metal oxide films on substrate. [114] Xu et al prepared a 1-1.5 nm thick Mo film on the Si/SiO 2 substrate via magnetron sputtering, and tellurized the Mo film at 620 °C with different growth times. 1T′ phase MoTe 2 was found to fully form at centimeter scale for the short growth time.…”
Section: Sulfurization/selenization/tellurization Of the Predeposited Thin Filmmentioning
confidence: 99%
“…[211,212] Predeposition of the precursor is another approach to offer a more uniform precursor supply. [114,145,152,213] In addition to the conventional thermal evaporation, electron beam deposition or magnetron sputtering, [125,[214][215][216][217] ALD affords atomic film thickness precision control of the deposited film, benefiting the following reaction with chalcogens. [117,[218][219][220] Tan et al used ALD to deposit MoCl 5 film and sulfurize it with H 2 S to generate 5.08 cm (2 in.)…”
Section: Layer Numbermentioning
confidence: 99%
“…Various metals and nonmetals have been explored as growth substrates for the large-area preparation of 2D materials ( Qin et al., 2020 ). The representative substrates used for growing graphene and 2D hexagonal boron nitride ( h -BN) layers are Cu ( Kim et al., 2012 ; Li et al., 2009 ) and Ni ( Shi et al., 2010 ; Yu et al., 2008 ), while inert nonmetal substrates ( Wang et al., 2020 ) such as SiO 2 ( Lee et al., 2012b , 2013 ) and sapphire ( Lee et al., 2013 ) are widely used for 2D transition metal dichalcogenide (TMDC) growth. However, poor quality, low growth rate, and non-uniform structure of the obtained materials are still insurmountable problems in using these substrates.…”
Section: Introductionmentioning
confidence: 99%