International Conference on Molecular Bean Epitaxy
DOI: 10.1109/mbe.2002.1037820
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Controlled n-type doping of antimonide/arsenide heterostructures using GaTe

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Cited by 2 publications
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“…The high carrier concentration estimated from simulation fits very well with the value of 3.3 × 10 19 cm −3 and 2.3 × 10 19 cm −3 determined from other surface analytical techniques x-ray photoelectron spectroscopy (XPS) and ultra violet photoelectron spectroscopy (UPS), respectively [37]. Further, the value of carrier concentration also in excellent agreement with those reported earlier by Bennet et al [38]. on GaAs and GaSb thin films at this GaTe cell temperature.…”
Section: Ensemble Nw Photodetectorsupporting
confidence: 89%
“…The high carrier concentration estimated from simulation fits very well with the value of 3.3 × 10 19 cm −3 and 2.3 × 10 19 cm −3 determined from other surface analytical techniques x-ray photoelectron spectroscopy (XPS) and ultra violet photoelectron spectroscopy (UPS), respectively [37]. Further, the value of carrier concentration also in excellent agreement with those reported earlier by Bennet et al [38]. on GaAs and GaSb thin films at this GaTe cell temperature.…”
Section: Ensemble Nw Photodetectorsupporting
confidence: 89%
“…The phonon-limited mobility of graphene on SiO 2 compares favorably to that of InAs and InSb high elec-tron mobility transistors, for which the highest mobilities achieved in actual devices are ~30,000-40,000 cm 2 /Vs. 54 The on/off resistivity ratio of graphene FETs is only ~100:1 in the best devices, but this is suitable for analog device applications.…”
Section: Graphene Electronics Gapless Analog Devicesmentioning
confidence: 99%