2019
DOI: 10.1038/s42005-019-0253-2
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Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision

Abstract: Interaction of a solid material with focused, intense pulses of high-energy photons or other particles (such as electrons and ions) creates a strong electronic excitation state within an ultra-short time and on ultra-small spatial scales. This offers the possibility to control the response of a material on a spatial scale less than a nanometer—crucial for the next generation of nano-devices. Here we create craters on the surface of a silicon substrate by focusing single femtosecond extreme ultraviolet pulse fr… Show more

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Cited by 29 publications
(16 citation statements)
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“…Figures 1(a) and 1(b) show atomic force microscope (AFM) images of damage structures on the Si surface formed by femtosecond soft x-ray laser pulse irradiations [9]. In the case of the 13.5 nm wavelength irradiation, the first changes of silicon surface appeared around the irradiation fluence of 150-250 mJ/cm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…Figures 1(a) and 1(b) show atomic force microscope (AFM) images of damage structures on the Si surface formed by femtosecond soft x-ray laser pulse irradiations [9]. In the case of the 13.5 nm wavelength irradiation, the first changes of silicon surface appeared around the irradiation fluence of 150-250 mJ/cm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…The SXFEL shots were attenuated to suitable intensity by using Zr filters having various thicknesses (0.1, 0.2, 0.5, 1.0, and 2.0 µm thickness or these combination). Details of the system have been reported elsewhere [22][23][24].…”
Section: Methodsmentioning
confidence: 99%
“…The simulation tool, XTANT can provide transient thermodynamic 32 , 33 and optical parameters 10 , 34 as well as atomic trajectories within irradiated samples. Its reliability has been successfully validated against a number of experimental studies 10 , 34 , 35 . Notably, in Ref.…”
Section: Introductionmentioning
confidence: 99%