Controlling refractive index in AlN films by texture and crystallinity manipulation

Giba, Alaa E.; Pigeat, P.; Bruyère, Stéphanie; Easwarakhanthan, T.; Mücklich, Frank; Horwat, David

doi:10.1016/j.tsf.2017.06.057

Cited by 20 publications

(11 citation statements)

References 53 publications

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“…In addition to high refractive index, AlN has the characteristic of high transmittance. Many literatures [26][27][28] reported that AlN films with more than 80% transmittance in visible band can be obtained by DC magnetron sputtering technology. AlN films with high refractive index and light transmittance have excellent properties for optoelectronic applications, such as solar cell protective coatings [26] and heat dissipation material for high power lighting devices [29].…”

Section: Resultsmentioning

confidence: 99%

Influence of nitrogen flow ratio on the optical property of AlN deposited by DC magnetron sputtering on Si (100) substrate

Han

Cui

Xing

et al. 2020

Micro & Nano Letters

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Aluminum nitride (AlN) films were deposited on Si (100) substrate at room temperature in different N 2 flow ratios (N 2 /(N 2 + Ar)) by direct current (DC) magnetron sputtering. AlN films were prepared with the N 2 flow ratios from 20 to 50%. The intensity of X-ray diffraction peak on (002) plane enhanced with the increase of N 2 flow ratio. When the flow ratio of N 2 was 50%, the AlN film tended to be the most preferred orientation of (002) plane with the value of full width half maximum being 0.34°. Optical property was studied by ellipsometer and the refractive index of the samples was between 1.92 and 2.05. According to the Fourier transform infrared spectroscopy, the density of Al-N bonds went up gradually and the tensile stress had a rising trend with the increasing N 2 flow ratio. In short, this work is helpful for the growth of AlN buffer layer deposited on Si (100) substrate.

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Section: Resultsmentioning

confidence: 99%

Influence of nitrogen flow ratio on the optical property of AlN deposited by DC magnetron sputtering on Si (100) substrate

Han

Cui

Xing

et al. 2020

Micro & Nano Letters

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“…More details can be found in ref. 24 The samples underwent a post-deposition rapid thermal annealing (RTA) at shows some random local structure disorder that may be due to incorporation of Ce ions. This local disorder in the microstructure leads to significant microstrain, as reported in.…”

Section: Methodsmentioning

confidence: 99%

From Blue to White Luminescence in Cerium-Doped Aluminum Oxynitride: Electronic Structure and Local Chemistry Perspectives

et al. 2018

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The excellent physical and chemical properties of aluminum oxynitride, Al(O)N, along with the tunable luminescence features of cerium ions (Ce) hold a promising future in white light sources based on chip technology. Manipulation of the light emission color from blue to green, to yellow and finally to white is demonstrated for the first time in Ce-doped Al(O)N thin films by tuning of the local structure, electronic structure and film thickness. Analysis of the electronic structure by electron energy loss spectroscopy (EELS) at the Ce-M4,5, Al-L2,3, O-K and N-K edges and photoluminescence spectroscopies highlight the essential role of oxygen and post-deposition annealing in changing the valence state of Ce ions from Ce 4+(optically inactive) to Ce 3+ (optically active) as well as the local field around Ce 3+ and, finally, in activating excitation pathways through generation of specific defect complexes in the oxynitride matrix.

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“…Texture, which describes the statistical distribution of grain orientations, is an important microstructural characteristic of thin films, as it can strongly influence the various functional properties [1][2][3][4][5][6][7][8][9][10]. Four types of texture component have been identified in thin films: random texture, in which the orientations of grains are fully random (no preferred growth orientation); fiber texture [1,11,12], where the orientation of a lattice plane is preferentially parallel to the substrate plane, while there is some rotational degree of freedom around the axis perpendicular to the substrate plane; in-plane texture (epitaxy), in which all three axes of the grains in thin film are aligned and fixed by the crystallographic orientations of single crystal substrates [1,11,13,14];…”

Section: Introductionmentioning

confidence: 99%

“…In addition, the degree of preferred orientation was estimated quantitatively by calculating Harris texture coefficient (T c ), following subtraction of background. T c is defined as[9,23,24]:…”

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confidence: 99%

Growth, interfacial microstructure and optical properties of NiO thin films with various types of texture

et al. 2019

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NiO thin films with random, fiber and in-plane textures have been successfully deposited at near room temperature by reactive magnetron sputtering on glass, silicon and Al 2 O 3 (0001) substrates. Self-texture related with the deposition conditions and crystallographic characters competes with the driving force from the matched substrate. Such a competition can be used to control the texture of thin films on matched substrates, especially when the promoting orientations from self-texture and substrate are different. Enhancing this competition tends to suppress the selftexture of NiO thin films on Al 2 O 3 (0001) substrates, whereas restricting the competition is beneficial to produce the in-plane textured NiO thin films. In addition, it is found that the optical transmittance of NiO thin films on Al 2 O 3 (0001) substrates can also be tuned by such competition. Interfacial microstructure analyses of NiO thin films on amorphous substrates clearly evidence the existence a nanocomposite layer at the initial growth, which is composed of NiO nanocrystals surrounded by amorphous matrix. In contrast, in-plane textured NiO thin films on Al 2 O 3 (0001) substrates exhibit sharp interface without nanocrystals or amorphous matrix. We believe these results provide a general framework of tuning the textures and properties of thin films on matched substrates.

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Controlling refractive index in AlN films by texture and crystallinity manipulation

Cited by 20 publications

References 53 publications

Influence of nitrogen flow ratio on the optical property of AlN deposited by DC magnetron sputtering on Si (100) substrate

Influence of nitrogen flow ratio on the optical property of AlN deposited by DC magnetron sputtering on Si (100) substrate

From Blue to White Luminescence in Cerium-Doped Aluminum Oxynitride: Electronic Structure and Local Chemistry Perspectives

Growth, interfacial microstructure and optical properties of NiO thin films with various types of texture

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