Controlling second-harmonic diffraction by nano-patterning MoS&lt;i/&gt;
            <sub>2</sub> monolayers

Löchner, Franz J. F.; Mupparapu, Rajeshkumar; Steinert, Michael; George, Antony; Tang, Zian; Turchanin, Andrey; Pertsch, Thomas; Staude, Isabelle; Setzpfandt, Frank

doi:10.1364/oe.27.035475

Cited by 28 publications

(32 citation statements)

References 55 publications

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“…For example, two recent works on controlling coherent SHG emission in the far field from MoS 2 -MLs patterned into gratings and complex holograms highlight the potential of the nanopatterning approach to realize tailored atomically thin nonlinear light sources. [29,30] Nanopatterning of graphene-ML and TMD-MLs was demonstrated earlier using focused gallium ion-beam milling, [31,32] focused helium ion-beam milling, [33] electron beam lithography (EBL)-based processes, [34] scanning probe lithography (SPL), [35] femtosecond direct laser writing (fs-DLW), [36] and local anodic oxidation. [37] However, the EBL and SPL nanopatterning methods use resists in the fabrication procedures, which can be hard to remove or can remain to a small extent as debris after development.…”

Section: Nanopatterning Of Monolayers Of Transition Metal Dichalcogenmentioning

confidence: 92%

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Facile Resist‐Free Nanopatterning of Monolayers of MoS₂ by Focused Ion‐Beam Milling

Mupparapu

Steinert

George

et al. 2020

Adv Materials Inter

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Nanopatterning of monolayers of transition metal dichalcogenides offers a new avenue for the creation of nanoscale light sources and their integration into hybrid nanophotonic systems. Here, focused gallium ion‐beam milling is employed as a resist‐free and simple nanofabrication approach to pattern MoS2 monolayers grown by chemical vapor deposition into nanoribbons. Using photoluminescence (PL), Raman, and valley polarization spectroscopy, it is investigated how the optoelectronic properties of the MoS2 monolayers are affected by the nanopatterning as a function of the ion fluence used for milling. Characteristic spectral shifts in the Raman and PL peaks are observed, which are indicative of a release of strain in patterned MoS2 monolayers as compared to the as‐grown monolayers. Furthermore, while the total PL signal is reduced in the patterned monolayers, using circular‐polarization‐resolved cryogenic PL spectroscopy it is shown that the valley polarization is well preserved for monolayers patterned within an optimal ion‐fluence range. The results and in particular the observed robustness of the valley polarization indicate that focused ion‐beam nanopatterned MoS2 monolayers are interesting candidates for their integration into hybrid quantum systems consisting of designed photonic nanostructures and precisely placed nanoscale excitonic light sources.

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Section: Nanopatterning Of Monolayers Of Transition Metal Dichalcogenmentioning

confidence: 92%

“…For example, two recent works on controlling coherent SHG emission in the far field from MoS 2 ‐MLs patterned into gratings and complex holograms highlight the potential of the nanopatterning approach to realize tailored atomically thin nonlinear light sources. [ 29,30 ]…”

Section: Introductionmentioning

confidence: 99%

Facile Resist‐Free Nanopatterning of Monolayers of MoS₂ by Focused Ion‐Beam Milling

Mupparapu

Steinert

George

et al. 2020

Adv Materials Inter

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Section: Other Patterning Techniquesmentioning

confidence: 99%

Fabrication Methods for Integrating 2D Materials

Moss¹

2021

Preprint

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With compact footprint, low energy consumption, high scalability, and mass producibility, chip-scale integrated devices are an indispensable part of modern technological change and development. Recent advances in two-dimensional (2D) layered materials with their unique structures and distinctive properties have motivated their on-chip integration, yielding a variety of functional devices with superior performance and new features. To realize integrated devices incorporating 2D materials, it requires a diverse range of device fabrication techniques, which are of fundamental importance to achieve good performance and high reproducibility. This paper reviews the state-of-art fabrication techniques for the on-chip integration of 2D materials. First, an overview of the material properties and on-chip applications of 2D materials is provided. Second, different approaches used for integrating 2D materials on chips are comprehensively reviewed, which are categorized into material synthesis, on-chip transfer, film patterning, and property tuning / modification. Third, the methods for integrating 2D van der Waals heterostructures are also discussed and summarized. Finally, the current challenges and future perspectives are highlighted.

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“…In ref [117], Löchner and coworkers demonstrated manipulation of second harmonic generation (SHG) emission from CVD-grown 1L-MoS 2 in the farfield, by patterning the monolayer via focused ion beam milling. For example, 1L-MoS 2 gratings with a fork like dislocation were fabricated (see microscope image in Figure 8(g)) to generate optical vortices of topological charge l ¼ 1 by the interference of coherent second harmonic (SH) emission from different regions of patterned 1L-MoS 2 .…”

Section: Patterningmentioning

confidence: 99%

Integration of two-dimensional transition metal dichalcogenides with Mie-resonant dielectric nanostructures

Mupparapu

Bucher

Staude

2020

Advances in Physics: X

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Integrating transition metal dichalcogenide (TMD) monolayers with dielectric nanostructures exhibiting Mie-like resonances opens a plethora of opportunities in manipulating their excitonic emission in the near-field and far-field regimes, yielding interactions spanning from weak to strong coupling regimes, and routing valley polarized chiral emission, to name just a few. Moreover, there is a completely new path unraveled recently by realizing dielectric resonators directly from TMDs, thus combining scatterer and emitter into a single entity. This hybrid configuration is promising to realize integrated active meta-optical devices in a facile manner. In this review article, we provide an overview of the state of the art on integrating monolayers of TMDs with Mieresonant photonic nanostructures. ARTICLE HISTORY

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Controlling second-harmonic diffraction by nano-patterning MoS<i/> ₂ monolayers

Cited by 28 publications

References 55 publications

Facile Resist‐Free Nanopatterning of Monolayers of MoS₂ by Focused Ion‐Beam Milling

Facile Resist‐Free Nanopatterning of Monolayers of MoS₂ by Focused Ion‐Beam Milling

Fabrication Methods for Integrating 2D Materials

Integration of two-dimensional transition metal dichalcogenides with Mie-resonant dielectric nanostructures

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Controlling second-harmonic diffraction by nano-patterning MoS<i/> 2 monolayers

Cited by 28 publications

References 55 publications

Facile Resist‐Free Nanopatterning of Monolayers of MoS2 by Focused Ion‐Beam Milling

Facile Resist‐Free Nanopatterning of Monolayers of MoS2 by Focused Ion‐Beam Milling

Fabrication Methods for Integrating 2D Materials

Integration of two-dimensional transition metal dichalcogenides with Mie-resonant dielectric nanostructures

Contact Info

Product

Resources

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Controlling second-harmonic diffraction by nano-patterning MoS<i/> ₂ monolayers

Facile Resist‐Free Nanopatterning of Monolayers of MoS₂ by Focused Ion‐Beam Milling

Facile Resist‐Free Nanopatterning of Monolayers of MoS₂ by Focused Ion‐Beam Milling