2017
DOI: 10.1088/1361-6528/aa61dd
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Controlling the growth of Bi(110) and Bi(111) films on an insulating substrate

Abstract: Here we demonstrate the controlled growth of Bi (110) and Bi(111) films on an (insulating) α-Al 2 O 3 (0001) substrate by surface X-ray diffraction and X-ray reflectivity using synchrotron ra- 1 arXiv:1611.04556v1 [cond-mat.mtrl-sci]

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Cited by 29 publications
(38 citation statements)
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“…It is worth noting that the (110)‐orientated Bi film is only stable at the thickness of nanometer scale, making it difficult to be synthesized. In previous study, Bi (110) film was prepared by electron beam evaporator at a very low temperature of 40 K . Here, the UHV circumstance and good controlling of thickness of the PLD system enable the Bi (110) to be fabricated at RT.…”
Section: Resultssupporting
confidence: 72%
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“…It is worth noting that the (110)‐orientated Bi film is only stable at the thickness of nanometer scale, making it difficult to be synthesized. In previous study, Bi (110) film was prepared by electron beam evaporator at a very low temperature of 40 K . Here, the UHV circumstance and good controlling of thickness of the PLD system enable the Bi (110) to be fabricated at RT.…”
Section: Resultssupporting
confidence: 72%
“…It is worth noting that the (110)-orientated Bi film is only stable at the thickness of nanometer scale, making it difficult to be synthesized. In previous study, Bi (110) film was prepared by electron beam evaporator at a very low temperature of 40 K. 35 Here, the UHV circumstance and good controlling of thickness of the PLD system enable the Bi (110) to be fabricated at RT. From the HRTEM and SAED results ( Figure 2E,F), a rectangular crystal lattice with 4-fold symmetry can be observed, showing same atomic arrangement as the schematic structure in Figure 2D.…”
Section: Resultsmentioning
confidence: 99%
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“…Note that we fit up to limited 2θ angle (see the dashed line in Fig. 8) to ensure the dynamical scattering theory is applicable and stay far from the kinetical scattering regime [33,34]. From this we find a steep roughness increase going from 5 pairs (R C rms =0.27 nm and R N i rms =0.41 nm) to 10 pairs of Ni/C multi-layers (R C rms =1.3 nm and R N i rms =2.1 nm) grown by PLD at RT.…”
Section: Resultsmentioning
confidence: 99%